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Multilayer Mirrors For X-Ray Lithography

Published online by Cambridge University Press:  15 February 2011

Eberhard Spiller and
IBM T. J. Watson
Eberhard Spiller
Affiliation:
Research Center, P.O. Box 218, Yorktown Heights, NY 10598
IBM T. J. Watson
Affiliation:
Research Center, P.O. Box 218, Yorktown Heights, NY 10598
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Abstract

The applications of multilayer x-ray mirrors to x-ray lithography are reviewed. Topics included are: multilayer performance and characterization, testing and fabrication of large mirrors with figure errors in the Angstrom range, multilayer x-ray masks, and collimators.

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Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 306: Symposium K – Materials Aspects of X-Ray Lithography , 1993, 121
Copyright
Copyright © Materials Research Society 1993

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