Hostname: page-component-6898cfcb55-kwdml Total loading time: 0 Render date: 2026-11-11T10:12:43.773Z Has data issue: false hasContentIssue false

Nitride Laser Diodes With InGaN Based Mqw Structures

Published online by Cambridge University Press:  10 February 2011

Lisa Sugiura
Affiliation:
Advanced Semiconductor Devices Research Laboratories, R&D Center, Toshiba Corp., 1, Komukai Toshiba-cho, Saiwai-ku, Kawasaki 210, Japan lisa.sugiura@toshiba.co.jp
Jobji Nishio
Affiliation:
Advanced Semiconductor Devices Research Laboratories, R&D Center, Toshiba Corp., 1, Komukai Toshiba-cho, Saiwai-ku, Kawasaki 210, Japan lisa.sugiura@toshiba.co.jp
Masaaki Onomura
Affiliation:
Advanced Semiconductor Devices Research Laboratories, R&D Center, Toshiba Corp., 1, Komukai Toshiba-cho, Saiwai-ku, Kawasaki 210, Japan lisa.sugiura@toshiba.co.jp
Shin-Ya Nunoue
Affiliation:
Advanced Semiconductor Devices Research Laboratories, R&D Center, Toshiba Corp., 1, Komukai Toshiba-cho, Saiwai-ku, Kawasaki 210, Japan lisa.sugiura@toshiba.co.jp
Kazuhiko Itaya
Affiliation:
Advanced Semiconductor Devices Research Laboratories, R&D Center, Toshiba Corp., 1, Komukai Toshiba-cho, Saiwai-ku, Kawasaki 210, Japan lisa.sugiura@toshiba.co.jp
Masayuki Ishikawa
Affiliation:
Advanced Semiconductor Devices Research Laboratories, R&D Center, Toshiba Corp., 1, Komukai Toshiba-cho, Saiwai-ku, Kawasaki 210, Japan lisa.sugiura@toshiba.co.jp
Get access

Abstract

Advantages of applying III-V nitride materials for short wavelength light-emitting devices despite their extremely high dislocation density are discussed from the viewpoint of dislocation motion. There are also difficulties proper to these materials, which make it difficult to fabricate laser diodes. We present recent works to realize high performance laser diodes. We introduce the nitrogen ambient metalorganic chemical vapor deposition (MOCVD) growth which realizes the highly p-typed GaN films without any post-treatments. Some of our results respecting the room temperature pulsed operation of the conventional laser diode and the advanced inner stripe (IS) laser diode with InGaN based multi-quantum-well (MQW) grown by MOCVD are reported.

Information

Type
Research Article
Copyright
Copyright © Materials Research Society 1998

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

Article purchase

Temporarily unavailable