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Nonlinear Optical Microscopy for Imaging Patterned Self-Assembled Monolayers

Published online by Cambridge University Press:  15 February 2011

L. Smilowitz,
Q.X. Jia,
X. Yang,
D.Q. Li,
D. McBranch and
J.M. Robinson
L. Smilowitz
Affiliation:
Chemical Science and Technology Division Los Alamos National Laboratory, Los Alamos, NM 87545
Q.X. Jia
Affiliation:
Matenrals Science and Technology Division Los Alamos National Laboratory, Los Alamos, NM 87545
X. Yang
Affiliation:
Chemical Science and Technology Division Los Alamos National Laboratory, Los Alamos, NM 87545
D.Q. Li
Affiliation:
Chemical Science and Technology Division Los Alamos National Laboratory, Los Alamos, NM 87545
D. McBranch
Affiliation:
Chemical Science and Technology Division Los Alamos National Laboratory, Los Alamos, NM 87545
J.M. Robinson
Affiliation:
Chemical Science and Technology Division Los Alamos National Laboratory, Los Alamos, NM 87545
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Abstract

We have used the inherent surface sensitivity of second harmonic generation (SHG) to develop an instrument for nonlinear optical (NLO) microscopy of surfaces and interfaces. This optical technique is ideal for imaging nanometer thick self-assembled monolayers (SAM's) which have been patterned using photolithographic techniques. In this paper we demonstrate the application of SHG microscopy to patterned SAM's of the noncentrosymmetric molecule calixarene and discuss other potential applications for this new technique.

Information

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 440: Symposia CA – Structure and Evolution of Surfaces , 1996, 209
Copyright
Copyright © Materials Research Society 1997

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