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Oxide Films for Integrated Capacitors in Thin Film Functional Modules

Published online by Cambridge University Press:  21 March 2011

M. Klee,
D. Wissen,
W. Keur,
R. Kiewitt,
D. Bausen and
P. Lok
M. Klee
Affiliation:
Philips GmbH Forschungslaboratorien Aachen, Weiβhausstr. 2, 52066 Aachen, Germany, mareike.klee@philips.com
D. Wissen
Affiliation:
Philips GmbH Forschungslaboratorien Aachen, Weiβhausstr. 2, 52066 Aachen, Germany
W. Keur
Affiliation:
Philips Research Laboratories Eindhoven, P.O. BOX
R. Kiewitt
Affiliation:
Philips GmbH Forschungslaboratorien Aachen, Weiβhausstr. 2, 52066 Aachen, Germany
D. Bausen
Affiliation:
Philips GmbH Forschungslaboratorien Aachen, Weiβhausstr. 2, 52066 Aachen, Germany
P. Lok
Affiliation:
Philips Discrete Semiconductors, Nijmegen
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Abstract

Single oxide films as well as complex oxide films are intensively studied for multi-chip modules with integrated passive functions. In this paper the processing and properties of oxide films such as Ta2O5, TiO2, Nb2O5, Ta2O5 -Al2O3, Ta2O5–Nb2O5 as well as complex oxide films such as BiNbO4 and Ba1划xSrxTiO3 films will be discussed with respect to their integration into thin film functional modules.

Information

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 655 , 2000, CC13.1.1
Copyright
Copyright © Materials Research Society 2001

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