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Physical Self-Assembly And Nano-Patterning

Published online by Cambridge University Press:  01 February 2011

T.-M. Lu,
D.-X. Ye,
T. Karabacak and
G.-C. Wang
T.-M. Lu
Affiliation:
Department of Physics, Applied Physics and Astronomy, Rensselaer Polytechnic Institute, Troy, NY 12180–3590
D.-X. Ye
Affiliation:
Department of Physics, Applied Physics and Astronomy, Rensselaer Polytechnic Institute, Troy, NY 12180–3590
T. Karabacak
Affiliation:
Department of Physics, Applied Physics and Astronomy, Rensselaer Polytechnic Institute, Troy, NY 12180–3590
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Abstract

It is known that oblique angle deposition (or glancing angle deposition) can create 3D architectures that are otherwise difficult to produce using the conventional lithographic techniques. The technique relies on a self-assembly mechanism originated from a physical shadowing effect during deposition. In this paper we show examples of 3D nanostructures obtained by this oblique angle deposition on a templated substrate with regularly spaced pillar seeds. We show that common to this technique is the phenomenon of side-way growth on the seeds. The side-way growth leads to a fan-like structure at the initial stages of growth if the incident oblique angle is fixed during growth. Simulations based on a steering effect due to the attractive force between the incoming atom and the existing atoms on the surface produce a fanlike structure similar to that observed experimentally. We show that a two-phase substrate rotation scheme during deposition can dramatically reduce this fan-out effect and can lead to uniform and isolated columns.

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Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 849: Symposium KK – Kinetics-Driven Nanopatterning on Surfaces , 2004, KK8.4
Copyright
Copyright © Materials Research Society 2005

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References

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