Hostname: page-component-74656f9884-8r8nv Total loading time: 0 Render date: 2026-11-08T20:46:32.724Z Has data issue: false hasContentIssue false
  • English
  • Français

Recent Progress with Surface Analysis by Laser Ionization

Published online by Cambridge University Press:  25 February 2011

Christopher H. Becker
Christopher H. Becker*
Affiliation:
Chemical Physics Laboratory, Sri International, Menlo Park, CA 94025, USA
Get access

Abstract

This paper briefly reviews previous results and developments, then presents new results, using a novel surface analytical technique that uses non-resonant multiphoton ionization (MPI) of neutral atoms and molecules sputtered by an ion beam, or desorbed by an electron beam or laser beam. In this method, which we call surface analysis by laser ionization (SALI), the non-resonant MPI, or “laser ionization,” is coupled with state-of-the-art time-of-flight mass spectrometry to provide extremely sensitive, general, and readily quantifiable surface analysis. Examples are presented for two applications relevant to the semiconductor industry and for the analysis of the near surface region of two specially pretreated stainless steels. A discussion also describes the favorable prospects for implementation of SALI with submicron dimension liquid metal ion beams for microanalysis, including situations with electron beam sensitive samples.

Information

Type
Articles
Information
MRS Online Proceedings Library (OPL) , Volume 69: Symposium D – Materials Characterization , 1986 , 59
Copyright
Copyright © Materials Research Society 1986

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

Article purchase

Temporarily unavailable

References

1. Becker, C. H. and Gillen, K. T., Anal. Chem. 56, 1671 (1984).Google Scholar
2. Mamyrin, B.A., Karataev, V.I., Shmikk, D.V., and Zagulin, V.A., Sov. Phys.-- JETP (Engl. Transl.) 37, 45 (1973).Google Scholar
3. Benninghoven, A., Surface Sci. 53, 596 (1975).Google Scholar
4. Colton, R.J., J. Vac. Sci. Technol. 18, 737 (1981).CrossRefGoogle Scholar
5. Williams, P., in Applied Atomic Collision Physics, edited by Datz, S., (Academic, Orlando, FL, 1983) Vol.4, Chapter 7, pp. 327–377.Google Scholar
6. Williams, P., Scanning Electron Microscopy, Vol.2, 553 (1985).Google Scholar
7. Reuter, W., in: Secondary Ion Mass Spectrometry SIMS V, edited by Colton, R.J. and Simons, D.S., (Springer-Verlag, New York, 1986) in press.Google Scholar
8. Winograd, N., Baxter, J.P., and Kimock, F.M., Chem. Phys. Lett. 88, 581 (1982).Google Scholar
9. Pellin, M.J., Young, C.E., Calaway, W.F., and Gruen, D.M., Surface Sci. 144, 619 (1984).Google Scholar
10. Donohue, D.L., Christie, W.H., Goeringer, D.E., and McKown, H.S., Anal. Chem. 57, 1193 (1985).Google Scholar
11. Becker, C.H. and Gillen, K.T., Appl Phys. Lett. 45, 1063 (1984).Google Scholar
12. Zare, R. N, Science 226, 298 (1984).CrossRefGoogle Scholar
13. Becker, C.H. and Gillen, K.T., J. Vac. Sci. Technol. A, 1347 (1985).CrossRefGoogle Scholar
14. Becker, C.H. and Gillen, K.T., J. Opt. Soc. Am. B2, 1438 (1985).Google Scholar
15. Stahle, C.M., Thomson, D.J., Helms, C.R., Becker, C.H., Simmons, A., Appl. Phys. Lett. 47, 521 (1985).Google Scholar
16. Becker, C.H., Stahle, C.M., and Thomson, D.J., Mat. Res. Soc. Symp. Proc. 48, 447 (1985).Google Scholar
17. Becker, C.H. and Gillen, K.T., in Secondary Ion Mass Spectrometry SIMS V, edited by Colton, R.J. and Simons, D.S. (Springer-Verlag, New York, 1986) in press.Google Scholar
18. Becker, C.H., Malhotra, R., and John, G. A. St., SRI International report #PYU-1161 to NASA; manuscript in preparation.Google Scholar
19. Werner, H.W. and Morgan, A.E., J. Appl. Phys. 47, 1232 (1976).CrossRefGoogle Scholar
20. Andersen, H.H. and Bay, H.L., in Sputtering by Particle Bombardment I, edited by Behrisch, R., (Springer-Verlag, N.Y., 1981), Chap. 4, pp. 173, 184; G. Betz and G. K. Wehner, in Sputtering by Particle Bombardment II, edited by R. Behrisch, (Springer-Verlag, N.Y., 1983), Chap. 2, p. 58.Google Scholar
21. See, e.g., Levi-Setti, R., Crow, G., and Wang, Y.L., Scanning Electron Microscopy, Vol.2, 535 (1985).Google Scholar