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Resistometric Mapping using a Scanning Tunneling Microscope

Published online by Cambridge University Press:  10 February 2011

C I Lang  and
J Tapson
C I Lang
Affiliation:
Department of Materials Engineering, University of Cape Town, Private Bag, Rondebosch, 7700 South Africa, clang@engfac.uct.ac.za
J Tapson
Affiliation:
Department of Electrical Engineering, University of Cape Town, Private Bag, Rondebosch, 7700 South Africa, jtapson@eleceng.uct.ac.za
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Abstract

We present a method whereby spatial variations in the resistivity of bulk conductive specimens may be detected on the same scale as the microstructural variations from which they arise. This technique, a new development of scanning tunneling potentiometry, offers significant benefits for microstructural characterization and for investigation of microstructure/resistivity relationships in metallic materials.

Information

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 500: Symposium EE – Electrically Based Microstructural Characterization II , 1997 , 15
Copyright
Copyright © Materials Research Society 1998

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References

REFERENCES

1. Muralt, P. and Pohl, D.W., Appl. Phys. Lett. 48, 514 (1986).Google Scholar
2. Muralt, P., Meier, H., Pohl, D.W. and Salemink, H.W.M., Appl. Phys. Lett. 50, 1352 (1987).Google Scholar
3. Kirtley, J.R., Washburn, S. and Brady, M.J., Phys. Rev. Lett. 60, 1546 (1988).Google Scholar
4. Schneider, M.A., Wenderoth, M., Heinrich, A.J., Rosentreter, M.A. and Ulbrich, R.G., Appl. Phys. Lett. 69, 1327 (1996).Google Scholar
5. Tapson, J., PhD thesis, UCT (1994).Google Scholar
6. Dovek, M.M., Heben, M.J., Lang, C.A., Lewis, N.S. and Quate, C.F., Rev. Sci. Instrum. 59 2333 (1988).Google Scholar
7. Jacobs, H.O., Knapp, H.F., Muller, S. and Stemmer, A., Ultramicroscopy 69, 39 (1997).Google Scholar
8. Pelz, J.P. and Koch, R.H., Phys. Rev. B 41, 1212 (1990).Google Scholar