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Self-assembled PS-PMMA nanodot array pattern arranged in a parallelogram guide

Published online by Cambridge University Press:  26 February 2011

Kaori Kimura
Affiliation:
kaori.kimura@toshiba.co.jp, Toshiba Corporation, Corporate Research and Development Center, 1, Komukai Toshiba-cho, Saiwai-ku, Kawasaki, Kanagawa, 212-8582, Japan, +81-44-549-2381, +81-44-520-1802
Masatoshi Sakurai
Affiliation:
masatoshi.sakurai@toshiba.co.jp, Toshiba Corporation, Corporate Research and Development Center, Japan
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Abstract

Mask patterns for XY-type magnetic patterned media using phase separation of polystyrene-polymethylmethacrylate (PS-PMMA) block copolymer were fabricated. Parallelogram guides molded by the nanoimprint lithography controlled the PS-PMMA self-assembling pattern that formed in the guide area. 45nm-pitch defect-free PS-PMMA dot patterns were obtained within a 1μm × 1μm area by optimizing the PS-PMMA film thickness.

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