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Single-Source Precursors to Titanium Nitride Thin Films

Published online by Cambridge University Press:  22 February 2011

Charles H. Winter,
T. Suren Lewkebandara,
Philip H. Sheridan and
James W. Proscia
Charles H. Winter
Affiliation:
Department of Chemistry, Wayne State University, Detroit, MI 48202
T. Suren Lewkebandara
Affiliation:
Department of Chemistry, Wayne State University, Detroit, MI 48202
Philip H. Sheridan
Affiliation:
Department of Chemistry, Wayne State University, Detroit, MI 48202
James W. Proscia
Affiliation:
Ford Motor Company, Glass Division, Dearborn, MI 48120.
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Abstract

The syntheses of the first single-source precursors to gold-colored titanium nitride films are reported. The precursors have the empirical formula [TiCl2(NHR)2(NH2R)0–2] and [TiCl4(NH3)2] and are obtained upon treatment of titanium tetrachloride with alkylamines or ammonia in nonpolar organic solvents. Both precursors sublime without decomposition between 80–120 °C and 0.01–0.1 mmHg. Deposition of titanium nitride films on glass and silicon substrates was achieved using either precursor at substrate temperatures of 475–600 °C. The films were characterized by x-ray diffraction, resistivity measurements, and X-ray photoelectron spectroscopy. In particular, low levels of carbon and chlorine contaminants were observed in the films.

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