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Template Fabrication Challenges for Patterned Media

Published online by Cambridge University Press:  01 February 2011

Douglas Resnick,
Gerard Schmid,
Mike Miller,
Gary Doyle,
Chris Jones and
Dwayne LaBrake
Douglas Resnick
Affiliation:
dresnick@militho.com, Molecular Imprints, Inc., Strategic Development, 1807C West Braker Lane, Austin, TX, 78758, United States, 5126327375, 5123393799
Gerard Schmid
Affiliation:
gschmid@militho.com, Molecular Imprints, Inc., 1807C West Braker Lane, Austin, TX, 78758, United States
Mike Miller
Affiliation:
mmiller@militho.com, Molecular Imprints, Inc., 1807C West Braker Lane, Austin, TX, 78758, United States
Gary Doyle
Affiliation:
gdoyle@militho.com, Molecular Imprints, Inc., 1807C West Braker Lane, Austin, TX, 78758, United States
Chris Jones
Affiliation:
cjones@militho.com, Molecular Imprints, Inc., 1807C West Braker Lane, Austin, TX, 78758, United States
Dwayne LaBrake
Affiliation:
dlabrake@militho.com, Molecular Imprints, Inc., 1807C West Braker Lane, Austin, TX, 78758, United States
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Abstract

The Step and Flash Imprint Lithography (S-FILTM) process uses field-to-field drop dispensing of UV curable liquids for step and repeat patterning for applications where high-resolution mix-and-match overlay is desired. Several applications, including patterned media, photonic crystals and wire grid polarizers, are better served by a patterning process that prints the full wafer since alignment requirements are not so stringent. In this paper, a methodology for creating high resolution thin templates for full wafer (or disk) imprinting is described. The methods have been applied toward the imprinting of both patterned media and photonic crystal devices using a large area printing tool developed around the S-FIL process. Techniques for further enhancing the pattern density as well as a method for addressing feature image placement are described. Finally, a process for replicating a Master Template is discussed in detail.

Keywords

lithography (deposition)deviceslithography (removal)

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References

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