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The Thickness Effect on the Microstructure of Sputtered Films Studied by a New X-Ray Diffraction Method

Published online by Cambridge University Press:  22 February 2011

M. Hecq
M. Hecq*
Affiliation:
Laboratoire de Chimie Inorganique, Université de l'Etat à Mons, Avenue Maistriau, 23 B -7000 MONS, Belgíum
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Abstract

The microstructure of sputtered platinum thin films has been investigated by X-ray diffraction analysis. The (111) reflection was analysed by the variance and the Fourier methods. The effective particle size was calculated from the variance slope coefficient and the microstrain from the Fourier cosine coefficients assuming that the effective sizes calculated from both methods are identical. Various thickness thin films have been studied. The effective particle size (Dev) increases with ev increasing film thickness until a thickness of ≈ 1500 Å, then Dev becomes constant and independent on the thickness. The microstrain varies in an inverse way to Dev ; it decreases with increasing thickness. Above a thickness of 1500 Å, the microstrain is constant.

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Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 48: Symposium E – Applied Materials Characterization , 1985, 55
Copyright
Copyright © Materials Research Society 1985

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