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Top-down and bottom-up nanofabrication for multipurpose applications.

Published online by Cambridge University Press:  01 February 2011

Enzo Di Fabrizio,
Filippo Romanato,
Stefano Cabrini,
Francesco Deangelis,
Arum Amy Yu,
Rober Barsotti,
Gioia Dealla Giustina,
Giovanna Brusatin and
Fracesco Stellacci
Enzo Di Fabrizio
Affiliation:
difabrizio@tasc.infm.it, 1University Of Magna Graecia, Campus Germaneto, Viale Europa, Catanzaro, N/A, IT-88100, Italy, +09613694218
Filippo Romanato
Affiliation:
romanato@tasc.infm.it, INFM-CNR, Lab. TASC, S.S. 14 km 163.5, Trieste, N/A, I-34012, Italy
Stefano Cabrini
Affiliation:
stefano.cabrini@elettra.trieste.it, INFM-CNR, Lab. TASC, S.S. 14 km 163.5, Trieste, N/A, I-34012, Italy
Francesco Deangelis
Affiliation:
f.deangelis@unicz.it, University Of Magna Graecia, Campus Germaneto, Viale Europa, Catanzaro, N/A, IT-88100, Italy
Arum Amy Yu
Affiliation:
yu@mit.edu, MIT, DMSE, 77 Mass. Ave., Cambridge, MA, 02139, United States
Rober Barsotti
Affiliation:
barsotti@mit.edu, MIT, DMSE, 77 Mass. Ave., Cambridge, MA, 02139, United States
Gioia Dealla Giustina
Affiliation:
gioia.dellagiustina@unipd.it, University of Padova, Dep. of Mechanical Engineering, via Marzolo 9, Padova, N/A, I-35131, Italy
Giovanna Brusatin
Affiliation:
giovanna.brusatin@unipd.it, University of Padova, Dep. of Mechanical Engineering, via Marzolo 9, Padova, N/A, I-35131, Italy
Fracesco Stellacci
Affiliation:
frstella@mit.edu, MIT, DMSE, 77 Mass. Ave., Cambridge, MA, 02139, United States
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Abstract

In this article we will show three recent examples of combined strategies aiming at merging top-down and bottom-up approach for nanofabrication at nanoscale level. The first example shows the fabrication of nanogaps performed by Focus Ion Beam technique that have been used to measure the conductivity of few gold nanoparticles aggregates deposited by Dip Pen lithography. The second example deals with the parallel replica of high resolution master generated by Electron Beam lithography by means of an innovative lithographic process based on DNA supramolecular nano-stamping. The latter example proposes the possibility to generate, through radiation exposure, direct patterning of hybrid sol gel material doped with fluorescent molecules. The outline of the fabrication approaches and their scientific and technical perspective are discussed.

Keywords

lithography (removal)self-assemblysol-gel

Information

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 921: Symposium T – Nanomanufacturing , 2006, 0921-T03-06
Copyright
Copyright © Materials Research Society 2006

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