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Waste Minimization In Semiconductor Processing

Published online by Cambridge University Press:  15 February 2011

Steven J. Hardwick and
Joanne C. Mailloux
Steven J. Hardwick
Affiliation:
Novapure Corporation, 7 Commerce Drive, Danbury, CT 06810
Joanne C. Mailloux
Affiliation:
Novapure Corporation, 7 Commerce Drive, Danbury, CT 06810
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Abstract

The US semiconductor industry uses 5–7 thousand pounds of arsine annually. Fifty to eighty percent of the arsine used becomes a waste product, which requires abatement. Traditional methods of abatement are reviewed with an emphasis on dry chemical scrubbing. A variety of dry chemical scrubbing materials were evaluated for arsine capacity, using activated carbon as the baseline for comparison. A proprietary mixed oxide composition, employing copper oxide as the active ingredient was identified as having high capacity and efficiency. Disposal and possible reclamation options are discussed.

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References

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