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Wavelet Based Structural Analysis of Electroless Deposits in the Diffusion Limited Regime

Published online by Cambridge University Press:  03 September 2012

A. Arneodo,
F. Argoul,
A. Kuhn and
J.F. Muzy
A. Arneodo
Affiliation:
Centre de Recherche Paul Pascal, Avenue Schweitzer, 33600 Pessac, France
F. Argoul
Affiliation:
Centre de Recherche Paul Pascal, Avenue Schweitzer, 33600 Pessac, France
A. Kuhn
Affiliation:
Centre de Recherche Paul Pascal, Avenue Schweitzer, 33600 Pessac, France
J.F. Muzy
Affiliation:
Centre de Recherche Paul Pascal, Avenue Schweitzer, 33600 Pessac, France
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Abstract

We discuss the actual relevance of thin gap geometry electrodeposition to generate fractal patterns that mimic the morphology of Witten and Sander's diffusion-limited aggregates (DLA). Eliminating migration and convection, as well as electrochemical side reactions, we show that electroless deposition is a good candidate to meet the requirements for diffusion to be the rate limiting step of the growth process. We use the wavelet transform microscope to achieve a comparative structural characterization of both experimental electroless deposits and numerical DLA clusters. The fact that five-fold symmetry and Fibonacci hierarchical ordering are found as common predominant statistical features is, to our knowledge, the first demonstration, relying on an appropriate structural fractal analysis, of the existence of DLA morphologies in an experimental context.

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Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 367: Symposium P – Fractal Aspects of Materials , 1994, 43
Copyright
Copyright © Materials Research Society 1995

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