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ZnO:B thin films made by two-step growth method

Published online by Cambridge University Press:  08 May 2015

Hengsheng Zhang,
Fang Wang and
Wei Xiong
Hengsheng Zhang
Affiliation:
Hunan Gongchuang Photovatic Science and Technology Co. Ltd., No.1 Hongyuan Road, Hengyang, 421005, P.R.China
Fang Wang
Affiliation:
Hunan Gongchuang Photovatic Science and Technology Co. Ltd., No.1 Hongyuan Road, Hengyang, 421005, P.R.China
Wei Xiong
Affiliation:
Hunan Gongchuang Photovatic Science and Technology Co. Ltd., No.1 Hongyuan Road, Hengyang, 421005, P.R.China
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Abstract

Two-step growth method of low pressure chemical vapor deposition(LPCVD) process was employed to fabricate the ZnO:B-TCO film; For the first layer, the seed layer with a heavy doping concentration was deposited on the glass substrate, the film having higher deposition rate were then grown on the top of the first layer; It shows that the doping situations of the seed layer play an important role in electrical and optical performance of the whole ZnO:B-TCO layer, and the combination of this two properties is optimal when the doping ratio (B2H6/DEZ) was 0.4;

Keywords

chemical vapor deposition (CVD) (deposition)optical propertiesgrain size

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Type
Articles
Information
MRS Online Proceedings Library (OPL) , Volume 1771: Symposium B/C/D/E – Recent Advances in Photovoltaics , 2015, pp. 73 - 77
Copyright
Copyright © Materials Research Society 2015 

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References

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