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The stabilities and electronic structures of Aln Si12−n N12 (n = 0, 1, 2, and 4)

Published online by Cambridge University Press:  07 January 2016

Huihui Yang
Affiliation:
College of Physics and Electronic Engineering, Northwest Normal University, Lanzhou 730070, Gansu, China
Hongshan Chen*
Affiliation:
College of Physics and Electronic Engineering, Northwest Normal University, Lanzhou 730070, Gansu, China
*
a) Address all correspondence to this author. e-mail: chenhs@nwnu.edu.cn

Abstract

Aln Si12−n N12 (n = 0, 1, 2, and 4) are electron redundant systems. The calculations show that the stabilities of Aln Si12−n N12 and Al12N12 are very close. One Si atom in each Si2N2 square protrudes obviously and the cages are distorted. The excess electrons reside at the outside of the protrudent Si atoms as lone pair electrons. They occupy antibonding orbitals and form the highest occupied band. The Si–N bonds are covalent bonds with strong polarity. The overlap integral is 0.38 per Si–N bond and is 17% stronger than the overlap in Al12N12. The atoms in molecule charge on the in-plane and protrudent Si atoms are 3.13e and 1.65e, respectively. The lone pair electrons form large local dipole moments enhance the electrostatic interaction between the protrudent Si and N atoms. The energy gaps of the electron redundant cages Aln Si12−n N12 (n = 0, 1, 2, and 4) are about 1 eV smaller than the gap of Al12N12. As the lone pair electrons are loosely bond, the SiN-based cages have large hyper-polarizabilities and so have potential applications, such as nonlinear optical materials.

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Articles
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Copyright © Materials Research Society 2016 
Figure 0

FIG. 1. The optimized structures of Al12N12 and Si12N12 from two different views.

Figure 1

TABLE I. The bond length (in Å) in Al12N12 and Si12N12 calculated using different models.

Figure 2

FIG. 2. Low energy isomers of AlnSi12−nN12 (n = 2 and 4).

Figure 3

FIG. 3. Distribution of the binding energies of the different isomers of AlnSi12−nN12 (n = 1, 2, and 4) calculated at B3LYP/6-311G(d,p) level.

Figure 4

TABLE II. Binding energy (in eV) of Al12N12, Si12N12 and the most stable isomer of AlnSi12−nN12 (n = 1, 2, and 4) calculated using different models.

Figure 5

FIG. 4. Total and partial DOS and the overlap for Al12N12 and Si12N12.

Figure 6

FIG. 5. The highest occupied orbitals in Al12N12 and Si12N12. HOMO and HOMO−1of Al12N12 are 3-fold degenerate; HOMO and HOMO−1 of Si12N12 are doubly degenerate and the six orbitals form the lone pair electrons on the six protrudent Si atoms.

Figure 7

FIG. 6. Total and partial DOS of Al2Si10N12-a and Al4Si8N12-a.

Figure 8

TABLE III. Energy levels of HOMO, LUMO and band gap Eg for Al12N12 and the most stable structures of AlnSi12−nN12 (n = 0, 1, 2, and 4) calculated by B3LYP with different basis sets.

Figure 9

FIG. 7. The valence orbital levels of Al, N, and Si atoms.

Figure 10

TABLE IV. The integral of total density and the overlap of Al–N bonds and Si–N bonds in Al12N12, Si12N12, Al2Si10N12-a, and Al4Si8N12-a.

Figure 11

TABLE V. The NBO and AIM charge in pure Al12N12, Si12N12 and the most stable isomers of AlnSi12−nN12 (n = 2 and 4) calculated using MP2.

Figure 12

FIG. 8. The contour maps of ELF of Al12N12 and Si12N12. The values of the contour lines with an interval of 0.05.

Figure 13

TABLE VI. The polarizabilities (α) and hyperpolarizabilities (β0) (in a.u.) of Al12N12 and the most stable isomer of AlnSi12−nN12 (n = 0, 1, 2, and 4).