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Low-temperature plasmas induced in nitrogen by extreme ultraviolet (EUV) pulses

Published online by Cambridge University Press:  25 January 2018

A. Bartnik*
Affiliation:
Institute of Optoelectronics, Military University of Technology, Kaliskiego 2, 00-908 Warsaw, Poland
W. Skrzeczanowski
Affiliation:
Institute of Optoelectronics, Military University of Technology, Kaliskiego 2, 00-908 Warsaw, Poland
H. Fiedorowicz
Affiliation:
Institute of Optoelectronics, Military University of Technology, Kaliskiego 2, 00-908 Warsaw, Poland
P. Wachulak
Affiliation:
Institute of Optoelectronics, Military University of Technology, Kaliskiego 2, 00-908 Warsaw, Poland
T. Fok
Affiliation:
Institute of Optoelectronics, Military University of Technology, Kaliskiego 2, 00-908 Warsaw, Poland
*
Author for correspondence: A. Bartnik, Institute of Optoelectronics, Military University of Technology, Kaliskiego 2, 00-908 Warsaw, Poland. E-mail: andrzej.bartnik@wat.edu.pl

Abstract

In this work, a comparative study of low-temperature plasmas, induced in a gaseous nitrogen by photoionization of the gas using two different irradiation systems, was performed. Both systems were based on laser-produced Xe plasmas, emitting intense extreme ultraviolet (EUV) radiation pulses in a wide wavelength range. The essential difference between the systems concerned formation of the EUV beam. The first one utilized a dedicated ellipsoidal mirror for collecting and focusing of the EUV radiation. This way a high radiation fluence could be obtained for ionization of the N2 gas injected into the vacuum chamber. The second system did not contain any EUV collector. In this case, the nitrogen to be ionized was injected into the vicinity of the Xe plasma. In both cases, energies of emitted photons were sufficient for dissociative ionization, ionization of atoms or even ions. The resulting photoelectrons had also sufficiently high energy for further ionizations or excitations. Low-temperature plasmas, created this way, were investigated by spectral measurements in the EUV, ultraviolet (UV) and visible (VIS) spectral ranges. Time-resolved UV/VIS spectra, corresponding to single-charged ions, molecules, and molecular ions, were recorded. Numerical simulations of the molecular spectra were performed allowing one to estimate vibrational and rotational temperatures of plasmas created using both irradiation systems.

Information

Type
Research Article
Copyright
Copyright © Cambridge University Press 2018 
Figure 0

Fig. 1. Schemes of experimental arrangements employed for the creation of low-temperature plasmas: (a) containing the ellipsoidal EUV collector (system no. 1), (b) without any collector (system no. 2).

Figure 1

Fig. 2. Spectra of the radiation delivered by the LPP EUV sources employed in two experimental arrangements: (a) system no. 1, Xe plasma radiation reflected from the EUV collector; (b) system no. 2, direct Xe plasma radiation.

Figure 2

Fig. 3. Time profiles of radiation emitted from the laser-produced Xe plasma, recorded in the system no. 2, using the AXUV-HS1 detector with different filters: (a) Zr 250 nm; (b) UV radiation time profile obtained by subtraction of the signal recorded with the BK7 glass from the signal recorded with the CaF2 crystal; (c) Schott KG5 glass; (d) FL 1064-3, Thorlabs.

Figure 3

Fig. 4. Time-integrated EUV spectra acquired for low-temperature nitrogen plasmas created using different experimental arrangements: (a) system no. 1, (b) system no. 2.

Figure 4

Fig. 5. A survey emission spectra corresponding to these ${\rm N}_2^{+}$, N2 species, obtained using different experimental arrangements: (a) system no. 1, (b) system no. 2.

Figure 5

Fig. 6. The molecular spectrum, corresponding to the survey spectra presented in Fig. 5, obtained from numerical simulations performed using the Specair code.

Figure 6

Fig. 7. The high-resolution spectrum corresponding to the ${\rm N}_2^{+}$, $B^2\Sigma _u^ + - X^2\Sigma _g^ + $, electronic system with Δυ = 1: (a) experimental spectrum recorded using the system no. 1, (b) simulated spectrum.

Figure 7

Fig. 8. The high-resolution spectrum corresponding to the ${\rm N}_2^{+}$, $B^2\Sigma _u^ + - X^2\Sigma _g^ + $, electronic system with Δυ = 1: (a) experimental spectrum recorded using the system no. 2, (b) simulated spectrum.

Figure 8

Fig. 9. Temporal dependence of the nitrogen plasma emission measured in the system no. 2: (a) (0–0) emission bands corresponding to the C3Πu − B3Πg and $B^2\Sigma_u^{+} - X^2\Sigma_g^{+}$ electronic systems, (b) emission line corresponding to the $2s^22p3s(^1P_{\rm 1}^{\rm o} ) - 2s^22p3p(^1D_2)$ transitions.

Figure 9

Fig. 10. Spectrally integrated intensities measured for different distances between the laser produced Xe plasma and the outlet of the nozzle for the nitrogen injection: (a) (0–0) emission bands corresponding to the C3Πu − B3Πg and $B^2\Sigma _u^ + - X^2\Sigma _g^ + $ electronic systems, (b) emission line corresponding to the $2s^22p3s(^1P_{\rm 1}^{\rm o} ) - 2s^22p3p(^1D_2)$ transitions.