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Photodetectors based on sensitized two-dimensional transition metal dichalcogenides—A review

Published online by Cambridge University Press:  30 October 2017

Congpu Mu
Affiliation:
State Key Laboratory of Metastable Materials Science and Technology, Yanshan University, Qinhuangdao 066004, People’s Republic of China; and Hebei Key Laboratory of Microstructure Material Physics, Yanshan University, Qinhuangdao 066004, People’s Republic of China
Jianyong Xiang*
Affiliation:
State Key Laboratory of Metastable Materials Science and Technology, Yanshan University, Qinhuangdao 066004, People’s Republic of China
Zhongyuan Liu*
Affiliation:
State Key Laboratory of Metastable Materials Science and Technology, Yanshan University, Qinhuangdao 066004, People’s Republic of China
*
a) Address all correspondence to these authors. e-mail: jyxiang@ysu.edu.cn

Abstract

Atomically thin transition metal dichalcogenides (TMDCs), such as WS2 and MoS2, have opened up new opportunities for the next generation of optoelectronics owing to their unique properties such as optical transparency, high carrier mobility, widely tunable band gap, and strong light–matter interaction. The photodetection performance relies primarily on the light absorption efficiency and separation efficiency of photoexcited electron–holes. The photodetectors with all broadband response, high photoconductive gain, high response speed, and high detectivity is arduous challenge to realize using one photo-active material. Building of photodetectors composed of two or more light absorber materials of different band gaps was an efficient route to realize high performance light detection. The application of a thin sensitizing layer atop the TMDCs has proven to be a viable route to improve the photodetection performance due to the efficient charge separation at the interface, and fast charge transfer process due to the high carrier mobility. In this article, we review the progress made toward hybrid photodetector based on TMDCs with various sensitizers from metal to large band-gap semiconductor in architectures from zero-dimensional quantum dot to two-dimensional crystal.

Information

Type
Invited Review
Copyright
Copyright © Materials Research Society 2017 
Figure 0

FIG. 1. (a) Top and cross-section view of WS2 atomic structure. Electronic band structure (left) and total density of states (DOC; right) for (b) bulk and (c) monolayer WS2, respectively;34 (d) differential reflectance spectra; (e) normalized PL spectra with different layer numbers; and (f) relative quantum yield of mechanically exfoliated WS2 as function of layer number.39 (Reprinted with permissions from: (a–c) Gutiérrez et al.,34 and (d–f) Xu et al.,39 © 2013, 2014 American Chemical Society, respectively.)

Figure 1

FIG. 2. (a) Mobility and (b) band-gap plot of typical monolayer 2D-materials [except that SnSe (multilayer), InSe (multilayer), HfS2 (7.8 nm), PbS (QDs film), PbSe (NCs film), MoTe2 (fewer-layers), HfSe2 (fewer-layers), SnSe2 (84 nm), MoO3 (8-layer), SnS (not applicable, N/A), SnS2 (N/A), CH3NH3PbI3, and CH3NH3PbBr3 (film)]; all mobilities cited from Refs. 1, 20, 37, and 68–86. Band alignment of various monolayer 2D-materials [except that SnSe (N/A), SnS (N/A), InSe (Bulk), PbS (QDs film), PbSe (QDs film), CH3NH3PbI3 and CH3NH3PbBr3 (film)]; all the parameters cited from Refs. 87–97.

Figure 2

FIG. 3. Typical physical transitions and phenomena associated with photoelectronic effects in homogeneous semiconductors.

Figure 3

FIG. 4. (a) Schematic diagram of WS2/PbS FETs. (b) Temporal photocurrent response of a WS2/PbS FET under red light irradiation of 845 mW/cm2. (c) Photocurrent of a photoswitch during 500 cycles with the relationship of irradiation. (d) Schematic of the band diagram of WS2/PbS heterostructure, and (e) schematic drawing shows change generation and transfer process under the illumination.29 (Reprinted with permissions from Yu et al.,29 © 2017 American Chemical Society.)

Figure 4

FIG. 5. (a) Statistical distribution of thickness for BP NSs. (b) Schematic illustration of a BP/WS2 hybrid phototransistor. (c) Responsivity as a function of power density under illumination of 532 nm. (d) Variations of responsivity with the wavelength of the incident light. Inset is the schematic energy band diagram of BP/WS2.117 (Reprinted with permissions from: Jia et al.,117 © 2017 Springer.)

Figure 5

TABLE I. Performance parameters of phototransistors based on 2D materials decorated with varied materials.

Figure 6

FIG. 6. (a) Schematic illustration of photodetector decorated by sensitizer, (b) energy level diagram for heterojunction between SnS and WS2, (c) average thickness of SnS NSs deposited on a WS2 monolayer, (d) normalized photocurrent augmentation of decorated devices, photoresponsivity as function of coverage ratio and gating voltage under (e) 457 nm and (f) 1064 nm.33 (Reprinted with permissions from Jia et al.,33 © 2017 Royal Society of Chemistry.)

Figure 7

TABLE II. Photoresponsivity of WS2/SnS phototransistors with coverage ratio, average thickness of SnS NSs.33 (Reprinted with permissions from Jia et al.,33 © 2017 Royal Society of Chemistry.)

Figure 8

FIG. 7. (a) Top and side views for atomistic illustration of vertical MoS2/WS2 bilayers; (b) PL spectra of heterostructure and Lorentzian fitting at 77 K; (c) band-gap alignment of MoS2/WS2 heterostructure126 (Reprinted with permissions from Zhang et al.,123 © 2015 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.)

Figure 9

FIG. 8. (a) Schematic of the Gr/WS2/Gr heterostructure, (b) (left axis) I–V curves taken under illumination at gate voltages from −20 (red) to +20 V (blue) after doping, (c) schematic band diagram for Gr/WS2/Gr heterostructure with and without a built-in electric field to separate photogenerated electron–hole pairs,130 (d) MoS2/WS2 heterojunction arrays, (e) schematic of MoS2/WS2 heterojunction phototransistor, (f) time-dependent photocurrent of MoS2/WS2 vertical heterostructure, (g) dependence of photocurrent and photoresponsivity on incident light power.1 (Reprinted with permissions from (a–c) Britnell et al.,130 © 2013 American Association for the Advancement of Science and (d–g) Xue et al.,130 © 2016 American Chemical Society, respectively.)

Figure 10

TABLE III. Photoelectric performance of photodetector based on 2D heterostructures.

Figure 11

FIG. 9. (a) Schematic of Cl-doped fewer-layers WS2 back-gate FET, (b) transfer length method resistances of Cl-doped WS2 and MoS2,151 photocurrent response of (c) the SL WS2, (d) the BL WS2, and (e) the ML WS2 FET by 220-nm-dominant deep ultraviolet (DUV) illumination before and after the 30-min DUV + N2 treatment.152 (Reprinted with permissions from (a and b) Yang et al.,151 © 2014 American Chemical Society and (c–e) Iqbal et al.,152 © 2014 Royal Society of Chemistry, respectively.)