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Strain landscapes and self-organization of free surfaces in complex oxide epitaxy

Published online by Cambridge University Press:  22 August 2017

Felip Sandiumenge*
Affiliation:
Institut de Ciència de Materials de Barcelona (ICMAB-CSIC), Avinguda dels Til∣lers s/n, Campus de la UAB, Bellaterra 08193, Catalonia, Spain
*
a) Address all correspondence to this author. e-mail: felip@icmab.cat

Abstract

The growth behavior of epitaxial transition metal oxides with the perovskite structure often shows discrepancies with models established for semiconductor and metal films. The reason is rooted in the versatility of such octahedral framework structures to accommodate the interfacial dissimilarity and the participation of strongly coupled electron and lattice degrees of freedom in strain relaxation mechanisms. Here, we revisit the behavior of the prototypic La0.7Sr0.3MnO3 manganite under specific growth conditions, enabling the isolation of pure octahedral tilting and misfit dislocation mechanisms in the same material. Analysis of the observed behavior provides insights into the competition between octahedral tilting and classical relaxation mechanisms by misfit dislocations or domain formation, and the effect of additional contributions to dissimilarity such as symmetry mismatch and polar discontinuities. Moreover, given the intimate association between misfit relaxation and self-organization mechanisms, opportunities and limitations of the observed behavior in the generation of novel bottom-up functional nanostructures is also addressed.

Information

Type
Invited Review
Copyright
Copyright © Materials Research Society 2017 
Figure 0

FIG. 1. (a) Pseudocubic crystal structure of a distorted ABO3 perovskite. Oxygen atoms are shown in red; B cations occupy the center of the oxygen octahedra; and the central A cation, shown in green, is located within the cuboctahedral cavities left between the octahedra. The whole structure forms an interconnected network of corner-sharing octahedra. Lattice distortions can be derived from the cubic aristotype according to octahedral rotations about the base vectors of the cubic unit cell as indicated. The aristotype is characterized by the absence of octahedral rotations (α = β = γ = 0). (b) The crystal structure on the left corresponds to the relaxed rhombohedral LSMO phase viewed along a 〈001〉 axis. In this structure α = β = γ ∼ 5.2°, which can be reduced to a single rotation about the [111] axis of ω ∼ 7.5°. The crystal structure shown on the right is obtained from the relaxed one by applying a biaxial compressive strain of ε = −2.3% along the basal [001] and [010] directions, and allowing the lattice to deform by octahedral rotations without elastic distortions. After compression, the new rotation angles are α ∼ 10.2° and ω ∼ 14.7°, yielding a ∼7% reduction of the unit cell volume. This illustration simulates the unrealistic matching of LSMO on a LAO substrate by rigid octahedron rotations. (c) The scheme on the left shows a pseudocubic rhombohedral lattice projected on to the (001) plane of a cubic substrate. The right drawing illustrates the mesoscale matching of the rhombohedral lattice with the cubic one by restoring the mx and my mirror planes absent in the former, to illustrate the role of ferroelastic domains in the relaxation of misfit shear strains.

Figure 1

FIG. 2. Stacking sequences of atomic planes in the LSMO/STO and LSMO/LAO heterostructures and associated sources of dissimilarity. From right to left: Polar discontinuity resulting from the different charges carried by atomic planes in the film and the substrate; symmetry mismatch between the octahedral tilt systems of the film and the substrate; rhombohedral angle referred to the pseudocubic representation; and corresponding values of the lattice parameter (normal) and angular (shear) misfit strains.

Figure 2

FIG. 3. Accommodation of lattice misfit by octahedral tiltings. The left panel shows the structure of a perovskite film with the tetragonal tilt system a0a0a−, under a tensile misfit strain cos−1 γ − 1 on a cubic substrate. The misfit strain is totally relaxed by suppressing the γ rotation, as shown in the right panel. Blue squares show the equatorial plane of the BO6 octahedra. Insets depict the corresponding atomic structures. Oxygen atoms are shown in red, B-site cations in lilac, and A-site cations in pink.

Figure 3

FIG. 4. Thickness dependence of the in-plane and out-of-plane lattice parameters in the LSMO/STO (a) and LSMO/LAO (b) systems. Note that the thickness in (a) is plotted on a logarithmic scale. Data from Refs. 12 and 69.

Figure 4

FIG. 5. Thickness dependence of the Poisson’s ration in the LSMO/STO system (data from Ref. 12). The variation draws three deformation regimes: between 1.9 and ∼10 nm the evolution of the Poisson’s ration is governed by the progressive unbalance between the electronic energy gain associated to the Jahn–Teller distortion of the MnO6 octahedra and the elastic energy required to match the film with the substrate, driven by the progressive oxidation of Mn cations. The evolution of the octahedral distortion is schematically illustrated in the inset; between 10 and ∼25 nm, the LSMO film exhibits elastic behavior without tiltings, as schematically depicted in the inset, and between 25 and 500 nm, the evolution of the Poisson’s ratio is governed by the progressive unbalance between elastic and tilting contributions to the distortion. The respective tilt systems, monoclinic a−a−c− and rhombohedral a−a−a−, are indicated.

Figure 5

FIG. 6. (a) AFM image showing the topography of a 3.5 nm thick film, consisting of ridges aligned with the [100] and [010] directions, and terraces; the color scale bar corresponds to a full range of 1.5 nm. (b) Orientation contrast SEM images revealing the MD network of the same film. The scale bar is the same for both images. It can be observed that the ridge pattern mimics the underlying buried dislocation network. Figure from Ref. 68.

Figure 6

FIG. 7. (a) Histograms of the lateral MD spacing in LSMO/LAO films for film thicknesses of 3.5, 7, and 14 nm, as indicated in the panels. (b) Thickness dependence of the MD density on the reciprocal film thickness, as measured by SEM (black symbols) and XRD as estimated from the LSMO cell parameter value (green symbols) and from X-ray diffraction satellite peak positions (red symbols), along with the standard deviation of the distribution. The MD density required for total relaxation is indicated by ρrel. Figure modified from Ref. 69.

Figure 7

FIG. 8. (a) Calculated modulation of the surface chemical potential for 3.5 and 6 nm thick films. Sharp maxima occur at the locus of the buried MDs. The calculation was performed using average MD spacings experimentally determined for each thickness. (b) Cross-section high resolution transmission electron microscopy image corresponding to a 3.5 nm thick film, exhibiting a MD shown inside the white circle and an undulated surface (outgrowths are indicated by red arrows). Note that the sharp minima in Δμd(x) found in the 3.5 nm thick film occurs at the locus of the outgrowths identified in (b). Data from Ref. 68.

Figure 8

FIG. 9. Domain size dependence on the square root of the film thickness, h1/2. Inset shows a bright field transmission electron microscopy image of the twin pattern viewed along the [001] zone axis of a LSMO/STO film. Data from Ref. 70.