Hostname: page-component-74656f9884-2dmjx Total loading time: 0 Render date: 2026-11-07T14:28:51.689Z Has data issue: false hasContentIssue false

Near atomic scale quantification of a diffusive phase transformation in (Zn,Mg)O/Al2O3 using dynamic atom probe tomography

Published online by Cambridge University Press:  13 April 2015

Rita Kirchhofer
Affiliation:
Metallurgical and Materials Engineering, Colorado Center for Advanced Ceramics, Colorado School of Mines, Golden, Colorado 80401, USA
David R. Diercks
Affiliation:
Metallurgical and Materials Engineering, Colorado Center for Advanced Ceramics, Colorado School of Mines, Golden, Colorado 80401, USA
Brian P. Gorman*
Affiliation:
Metallurgical and Materials Engineering, Colorado Center for Advanced Ceramics, Colorado School of Mines, Golden, Colorado 80401, USA
*
a) Address all correspondence to this author. e-mail: bgorman@mines.edu

Abstract

The onset of a diffusive phase transformation in thin film Zn0.70Mg0.29Ga0.01O deposited on c-oriented sapphire (α-Al2O3) was explored using dynamic heating experiments in a laser pulsed atom probe tomography (APT) instrument and correlated with transmission electron microscopy (TEM). Specimens were laser irradiated using 100–1000 pJ pulse energies with initial temperatures between 50 and 300 K for up to 8.64 × 1010 pulses. Using a finite element model, it was possible to estimate the temperatures reached by the specimen during laser pulsing, which were calculated to be 300 K to above 1000 K. Due to the small sample volume, quench rates were estimated to be 1013 K/s, allowing for nanosecond temporal resolution during the in situ heating experiments. The formation of Mg-spinel (MgAl2O4) at the transparent conductive oxide/α-Al2O3 substrate interface was observed using electron diffraction and confirmed by atom probe analysis. Subnanometer spatial resolution in the atom probe data reconstructions allowed for near atomic level diffusion to be observed. This work demonstrates the feasibility of conducting these experiments in situ using a combined TEM and APT instrument.

Information

Type
Articles
Copyright
Copyright © Materials Research Society 2015 
Figure 0

FIG. 1. Equilibrium phase diagram for MgO + Al2O3 (black) and ZnO + Al2O3 (blue) showing the formation of spinel at 50 mol% Al2O3.

Figure 1

TABLE I. Lattice parameters and crystallographic information for α-alumina, the ZnMgO:Ga film, and spinel.3,10,17–19

Figure 2

FIG. 2. Representation of an atom probe specimen modeled using COMSOL™ Multiphysics package showing the overall temperature distribution, geometry of the films, and the direction of the laser pulse.

Figure 3

FIG. 3. (a) TEM micrograph of a representative atom probe specimen showing the pre- and post-APT (blue) images overlaid, and (b) the corresponding reconstruction showing a fraction of the ions collected and the lattice spacing in the film. The α-alumina substrate is indicated in blue. Small areas of Mg enrichment are apparent at the interface with the ZnMgO:Ga film.

Figure 4

FIG. 4. (a) High-resolution TEM micrograph of the interface between the ZnMgO:Ga film and the α-Al2O3 substrate with the corresponding diffraction patterns. The reflections corresponding to the substrate (α-Al2O3) for B = $\left[ {2\bar 1\bar 10} \right]$ are shown. A diffraction pattern of both substrate and film revealed that ${\left[ {2\bar 1\bar 10} \right]_{\alpha {\rm{ - A}}{{\rm{l}}_2}{{\rm{O}}_3}}}\left\| {{{\left[ {0\bar 1\bar 10} \right]}_{{\rm{ZnMgO}}}}} \right.$. Epitaxial growth of the films was confirmed. (b) Atom probe detector event histogram displaying the location where ions hit the detector during analysis. The formation of a crystallographic pole was apparent and corresponds to the 0001 pole of the ZnMgO:Ga film.

Figure 5

TABLE II. Composition measurements for the ZnMgO:Ga film and α-Al2O3 substrate. The nominal composition of each phase is given in parentheses.

Figure 6

FIG. 5. Composition profile of an unirradiated ZnMgO:Ga film across the interface and α-Al2O3 substrate as a function of the distance from the interface. The interface thickness was approximately 3 nm before laser irradiation as indicated by the gray-boxed area. The spatial resolution in the analysis direction was set at 1 nm for the analysis.

Figure 7

FIG. 6. Specimen temperature (in K) as a function of time (in ps) after the laser pulse initiation. The maximum temperature predicted is displayed by the black curve. The inset shows the temperature at different locations along the surface of the specimen until an equilibrium temperature is achieved. Thermal equilibrium is reached within 70 ps and the temperature decays to 50 K within 1 μs of the pulse initiation.

Figure 8

FIG. 7. Relative temperature as a function of time after laser pulse initiation using a 100 pJ (dashed line) or 1000 pJ (solid line) for the pulse energy. The thermal model predicts relative increase in temperature ten times higher for a specimen subjected to a 1000 pJ laser pulse compared to a 100 pJ pulse. The change in TMax at 100 ps for the 1000 pJ/pulse is higher than for the 100 pJ/pulse.

Figure 9

FIG. 8. Composition profile of the ZnMgO:Ga film across the interface and α-Al2O3 substrate as a function of the distance from the interface. The interface thickness was approximately 3 nm after laser irradiation at 100 pJ/pulse for 8.64 × 1010 pulses. The spatial resolution in the analysis direction was set at 1 nm.

Figure 10

FIG. 9. (a) TEM micrograph of an atom probe specimen post-irradiation showing slight damage due to laser pulsing at 1000 pJ. (b) SADPs of the ZnMgO:Ga film (and α-alumina substrate) for two representative specimens after laser irradiation. The reflections due to the substrate and thin film were indexed in Fig. 4. Additional reflections (squares) due to spinel formation are also shown for B = [111]Spinel.

Figure 11

FIG. 10. Composition profiles for two specimens analyzed in the atom probe using a laser pulse energy of 100 pJ (top) and 1000 pJ (bottom). The specimen base temperature was 50 K and TMax > 300 K. The specimens showed different cation ratios within the film. The Al:Mg ratio in the bottom is ∼2:1 that is indicative of the formation of Mg-spinel.

Figure 12

FIG. 11. TEM micrographs of the specimen after FIB milling and before laser irradiation (left), after laser irradiation for 8.64 × 1010 pulses (middle), and post-APT analysis (right).

Figure 13

FIG. 12. (a) Vapor pressure of Zn extrapolated to the pressure used for atom probe analysis showing that for pZn ≈ 10−11 mbar the temperature for sublimation is ∼300 K. (b) Composition profile of a specimen analyzed using 100 pJ/pulse and 50 K as the specimen base temperature showing Zn depletion for approximately 8 nm from the surface.

Figure 14

FIG. 13. Al, Mg, and Zn concentrations at the boundary between the ZnMgO:Ga film and the α-Al2O3 substrate shown as ln(C) versus y2 plot. The slope of the fitted line is indicated for each element for the specimens irradiated at 1000 and 100 pJ/pulse. Note that the concentration gradient of Zn in the top graph could not be measured due to Zn sublimation from the film.

Figure 15

TABLE III. Calculated diffusion coefficients from composition profiles.

Figure 16

FIG. 14. Diffusion coefficients for Al in Al2O3 (circles) and ZnMgO:Ga (triangle) shown as ln(D) versus 1/T (×104 K). The D0 value estimated from data obtained between 1423 and 1873 K was 1.17 × 10−2 m2 s−1while a linear fit with the data obtained from measuring D using atom probe data showed that D0 was 3.1 × 10−12 m2 s−1.