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Gamma-ray source through inverse Compton scattering in a thermal hohlraum

Published online by Cambridge University Press:  28 August 2013

Y.L. Ping*
Affiliation:
Center for Applied Physics and Technology, Peking University, Beijing, Peoples Republic of China National Astronomical Observatories, Chinese Academy of Sciences, Beijing, Peoples Republic of China
X.T. He
Affiliation:
Center for Applied Physics and Technology, Peking University, Beijing, Peoples Republic of China Institute of Applied Physics and Computational Mathematics, Beijing, Peoples Republic of China
H. Zhang
Affiliation:
Institute of Applied Physics and Computational Mathematics, Beijing, Peoples Republic of China
B. Qiao
Affiliation:
Center for Applied Physics and Technology, Peking University, Beijing, Peoples Republic of China Center for Energy Research, University of California San Diego, La Jolla, California
H.B. Cai
Affiliation:
Center for Applied Physics and Technology, Peking University, Beijing, Peoples Republic of China Institute of Applied Physics and Computational Mathematics, Beijing, Peoples Republic of China
S.Y. Chen
Affiliation:
Center for Applied Physics and Technology, Peking University, Beijing, Peoples Republic of China
*
Address correspondence and reprint requests to: Y.L. Ping, Center for Applied Physics and Technology, Peking University, Beijing 100084, P.R. China. E-mail: ylping@pku.edu.cn

Abstract

A new inverse Compton scattering scheme for production of high-energy Gamma-ray sources is proposed in which a Giga-electronvolt (GeV) electron beam is injected into a thermal hohlraum. It is found that by increasing the hohlraum background temperature, the scattered photons experience kinematic pileup, resulting in more monochromatic spectrum and smaller scattering angle. When a relativistic electron beam with energy 1 GeV and charge 10nC is injected into a 0.5 keV hohlraum, 80% of the scattered photons have energy above 0.5 GeV.

Information

Type
Research Article
Copyright
Copyright © Cambridge University Press 2013 
Figure 0

Fig. 1. (Color online) Schematic configuration of γ-ray source production by injecting an electron beam into a hohlraum.

Figure 1

Fig. 2. (Color online) Differential distribution of the scattered photons calculated by Eq. (2) for Ee = 1 GeV electron passing through kT = 0.3 KeV hohlraum.

Figure 2

Fig. 3. Spectrum brightness for the case of Ee = 1 GeV and the background temperature respectively of kT = 0.3 KeV, 0.5 KeV, 1 KeV, respectively.

Figure 3

Fig. 4. (Color online) Differential distribution of the scattered photons calculated by Eq. (2) for Ee = 1 GeV electron passing through kT = 1 KeV.

Figure 4

Fig. 5. (Color online) Differential distribution of the scattered photons calculated by Eq. (2) for Ee = 10 GeV electron passing through kT = 1 KeV.