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Low temperature photoionized Ne plasmas induced by laser-plasma EUV sources

Published online by Cambridge University Press:  20 March 2015

A. Bartnik*
Affiliation:
Institute of Optoelectronics, Military University of Technology, Warsaw, Poland
H. Fiedorowicz
Affiliation:
Institute of Optoelectronics, Military University of Technology, Warsaw, Poland
T. Fok
Affiliation:
Institute of Optoelectronics, Military University of Technology, Warsaw, Poland
R. Jarocki
Affiliation:
Institute of Optoelectronics, Military University of Technology, Warsaw, Poland
M. Szczurek
Affiliation:
Institute of Optoelectronics, Military University of Technology, Warsaw, Poland
P. Wachulak
Affiliation:
Institute of Optoelectronics, Military University of Technology, Warsaw, Poland
*
Address correspondence and reprint requests to: A. Bartnik, Military University of Technology, Warsaw, Mazowsze, Poland. Email: andrzej.bartnik@wat.edu.pl

Abstract

In this work, two laser-produced plasma (LPP) sources – extreme ultraviolet (EUV) and a LPP soft X-ray (SXR) source were used to create Ne photoionized plasmas. A radiation beam was focused onto a gas stream, injected into a vacuum chamber synchronously with the radiation pulse. EUV radiation spanned a wide spectral range with pronounced maximum centered at λ≈11 nm, while in case of the SXR source spectral maximum was at λ≈1.4 nm. Emission spectra of photoionized plasmas created this way were measured in a wide spectral range λ = 10–100 nm. The dominating spectral lines originated from singly charged ions (Ne II) and neutral atoms (Ne I). For the highest radiation fluence, spectral lines originating from Ne III and even Ne IV species were detected. Differences between the experimental spectra, obtained for all irradiation conditions, were analyzed. They were attributed either to different fluence or spectral distribution of driving photons.

Information

Type
Research Article
Copyright
Copyright © Cambridge University Press 2015 
Figure 0

Fig. 1. Schematic view of the EUV Sources No. 1 and 2 indicating location of an auxiliary valve for gas injection into the interaction region, together with the EUV/VUV spectrograph (a) the EUV spectra of the focused radiation: Source No. 1 (b), Source No. 2 (c).

Figure 1

Fig. 2. Schematic view of the Source No. 3, indicating location of an auxiliary valve for gas injection into the interaction region, together with the EUV/VUV spectrograph (a) the SXR/EUV spectrum of direct plasma emission (b) and the SXR/EUV spectrum of the focused radiation (c).

Figure 2

Fig. 3. A typical spectrum obtained for Ne photoionized plasmas using the irradiation system based on the Source No. 1.

Figure 3

Fig. 4. A typical spectrum obtained for Ne photoionized plasmas using the irradiation system with the Source No. 2: (a) A long-wavelength range. (b) a short-wavelength range.

Figure 4

Fig. 5. A typical spectrum obtained for Ne photoionized plasmas using the irradiation system based on Source No. 3.