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Scanning ultrafast electron microscopy: Four-dimensional imaging of materials dynamics in space and time

Published online by Cambridge University Press:  10 July 2018

Ding-Shyue Yang
Affiliation:
University of Houston, USA; yang@uh.edu
Bolin Liao
Affiliation:
University of California, Santa Barbara, USA; bliao@ucsb.edu
Omar F. Mohammed
Affiliation:
Division of Physical Sciences and Engineering, King Abdullah University of Science and Technology, Saudi Arabia; omar.abdelsaboor@kaust.edu.sa

Abstract

Conventional electron microscopy during the last three decades has experienced tremendous developments, especially in equipment design and engineering, to become one of the most widely recognized and powerful tools for key research areas in materials science and nanotechnology. In this article, we discuss scanning ultrafast electron microscopy (S-UEM) as a new methodology for four-dimensional electron imaging of material surfaces. We also illustrate a few unique applications. By monitoring secondary electrons emitted from surfaces of photoactive materials, photo- and electron-impact-induced electrons and holes near surfaces, interfaces, and heterojunctions can be imaged with adequate spatial and temporal resolution. Charge separation, transport, and anisotropic motions as well as their dependence on carrier energies can be resolved. S-UEM is poised to directly image and visualize relevant interfacial dynamics in real space and time for emerging optoelectronic devices and help push their performance.

Information

Type
Ultrafast Imaging of Materials Dynamics
Copyright
Copyright © Materials Research Society 2018 
Figure 0

Figure 1. Schematic of scanning ultrafast electron microscopy (S-UEM). (a) S-UEM instrumentation using a modified scanning electron microscope with two laser beams, one for photoelectron generation (blue) and the other for photoexcitation or clocking (green). The inset micrographs give an example of the different images acquired at selected delay times between the laser and the photoelectron pulses.23 (b) Schematic of the electron source region using side illumination of a cooled sharp Schottky emitter.21 (c) Pump-probe scheme at 8 MHz (i.e., successive events separated by 125 ns) within a given dwell time at each pixel. The arrival times of the pump and probe pulses at the specimen differ by a delay time, Δt.26 Note: t, time; SE, secondary electron.

Figure 1

Figure 2. Imaging mechanisms of scanning ultrafast electron microscopy (S-UEM). (a) (Left) Schematic of raster imaging over both laser-illuminated and nonilluminated regions of a thin-film sample and (right) energy-gain mechanism producing bright contrast due to an enhanced secondary-electron yield from the excited electrons in the photoexcited region, using a direct-gap semiconductor as an example.26 (b) (Top) Two dynamical probing regimes and (bottom) typical image contrasts in positive and negative times with the respective energy-gain and energy-loss mechanisms. The schematic micrographs cover both photoexcited and unexcited regions, currently on the order of tens of micrometers. (Middle) For the new electron‒photon probing regime at negative times, the electron-impact dynamics (pink) initiated by an electron pulse (blue) may be clocked by the arrival of a photon pulse (green); the resulting contrast depends on how much the electron-impact dynamics is interrupted in the energy-loss mechanism as a result of carrier scattering in the laser-illuminated region.22 Note: SE, secondary electron; VB, valence band; CB, conduction band; h, Planck’s constant; ν, frequency.

Figure 2

Figure 3. Photocarrier dynamics in hydrogenated amorphous silicon and black phosphorus imaged by scanning ultrafast electron microscopy. (a) Time-resolved secondary electron images of the surface of hydrogenated amorphous silicon. The bright and dark contrasts indicate electron- and hole-rich regions. A clear spatial separation of electrons and holes is observed at an 827-ps delay time.34 (b) Variance of the spatial distribution of photoexcited hot holes on the surface of black phosphorus projected onto different directions and normalized to the initial distribution at 40 ps. It is clearly seen that the hot-carrier diffusion occurs preferentially along the armchair direction, labeled as “x.”37

Figure 3

Figure 4. Time-resolved secondary-electron (SE) images showing contrast evolution in InGaN nanowires (NWs) at an excitation of 515 nm at selected times for (a) an as-grown sample and (b) an octadecylthiol (ODT)-passivated one. The dashed ellipse indicates the laser spot on the NWs, which was approximately 40 µm in size. Directly comparing both samples indicates that the as-grown NWs exhibit more rapid recovery. (c) Extracted kinetics of the time-resolved SE intensities of the InGaN NWs from the as-grown and ODT-treated samples during a time window of 6000 ps. The faster recovery of the as-grown sample is evident. The structures of the two samples are shown in the inset micrographs.40 (d‒f) Time-resolved SE difference images at indicated delay times for undoped and Si-doped NWs at 515-nm excitation. The dashed ellipse indicates the laser footprint on the sample. The scale bar is 50 µm. (g) Temporal evolution of the SE intensity at the center of the laser footprint on the 200-ps time scale. The inset shows the dynamics on a 6-ns time window. The reverse trends of time constants (e.g., faster intensity drop and slower recovery for the red versus slower intensity drop and faster recovery for the green) suggest different roles of silicon dopants on the photocarrier dynamics in different temporal ranges.41