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Relativistic electron beam source with uniform high-density emitters by pulsed power generators

Published online by Cambridge University Press:  22 April 2009

Limin Li*
Affiliation:
College of Photoelectric Science and Engineering, National University of Defense Technology, Changsha, People's Republic of China
Lie Liu
Affiliation:
College of Photoelectric Science and Engineering, National University of Defense Technology, Changsha, People's Republic of China
Qifu Xu
Affiliation:
College of Photoelectric Science and Engineering, National University of Defense Technology, Changsha, People's Republic of China
Guoxin Chen
Affiliation:
College of Photoelectric Science and Engineering, National University of Defense Technology, Changsha, People's Republic of China
Lei Chang
Affiliation:
College of Photoelectric Science and Engineering, National University of Defense Technology, Changsha, People's Republic of China
Hong Wan
Affiliation:
Department of Material Engineering and Applied Chemistry, National University of Defense Technology, Changsha, People's Republic of China
Jianchun Wen
Affiliation:
College of Photoelectric Science and Engineering, National University of Defense Technology, Changsha, People's Republic of China
*
Address correspondence and reprint requests to: Limin Li, College of Photoelectric Science and Engineering, National University of Defense Technology, Changsha 410073, People's Republic of China. E-mail: newages1979@yahoo.com.cn

Abstract

The remaining challenges, confronting high-power microwave sources and pulsed power technology, stimulate the development of robust relativistic electron beam sources. This paper presents a carbon-fiber-aluminum cathode with high-density uniform emitters, which was tested in a single pulsed power generator (~450 kV, ~350 ns, ~50 Ω) and a repetitive one (350 kV, <10 ns, 150 Ω, and 100 Hz). The distribution and development of the cathode plasma was observed by time-and-space resolved diagnostics, and the uniformity of electron beam density was checked by taking x-ray images. A quasi-stationary behavior of the cathode plasma expansion was observed. It was found that the uniformity of the extracted electron beam is satisfactory in spite of individual plasma jets on the cathode surface. Under repetitively pulsed operation, this cathode exhibited a good shot-to-shot reproducibility even in poor vacuum. This new class of plasma cathodes offers a promising prospect of developing relativistic electron beam sources.

Information

Type
Research Article
Copyright
Copyright © Cambridge University Press 2009
Figure 0

Fig. 1. (Color online) Experimental setup for the generation of relativistic electron beams in single shot regime. The schematic shows the vacuum vessel with the HV pulse generator, cathode mount, cathode, anode, and vacuum pump. The diode gap can be changed by moving the shaft upon which the cathode is mounted.

Figure 1

Fig. 2. Schematic of a high-current electron beam generator using a Tesla transformer in repetitively pulsed operation.

Figure 2

Fig. 3. (Color online) Photograph (a) and SEM image (b) of the emission surface of the CFA cathode with the corresponding energy distribution spectrum (c), and side-view image (d).

Figure 3

Fig. 4. Waveforms of the accelerating voltage φac and the diode current Ib. The anode-cathode gap is dac = 20 mm. The CFA cathode is tested.

Figure 4

Table 1. Beam current Ib, average electric field E, beam current density jb, and beam power Pb for different values of dac

Figure 5

Fig. 5. (Color online) Impedance and perveance of the diode with the CFA cathode at dac = 20 mm. The dashed line is the perveance calculated from the “3/2” law with corrections for the 2D and edge effects.

Figure 6

Fig. 6. (Color online) Temporal behavior of diode gap and its closure rate for the CFA cathode at dac = 20 mm. The data for the closure rate are fitted by Lorentz functions.

Figure 7

Fig. 7. Front images of the light emission from the CFA cathode at different time delays τd with respect to the beginning of the accelerating pulse. Frame duration of 20 ns, jb = 400 A/cm2, and dac = 20 mm. (a) τd = 50 ns, (b) τd = 150 ns, (c) τd = 250 ns.

Figure 8

Fig. 8. (Color online) Side images of the light emission from the CFA cathode with different time delays τd with respect to the beginning of the accelerating pulse (cathode on the left and anode on the right): (a) τd = 50 ns, (b) τd = 150 ns, (c) τd = 250 ns. Conditions: jb = 400 A/cm2, and dac = 20 mm.

Figure 9

Fig. 9. Typical X-ray images of the anode foil obtained with the phosphor screen for different time delays with respect to the beginning of the accelerating pulse and at dac = 20 mm. (a) τd = 50 ns, (b) τd = 150 ns, (c) τd = 250 ns.

Figure 10

Fig. 10. Shot-to-shot reproducibility at different pressures. (a) Is an overlay of voltage pulses at the pressure of 3 × 10−4 torr; (b) and (c) are, respectively, voltage and current traces for the pressure of 1 × 10−4 torr. Here, the pulsed generator operated at a 100 Hz repetition rate.

Figure 11

Fig. 11. Plasma jet ejected from the CFA cathode.

Figure 12

Fig. 12. (Color online) Velocity distribution of plasma expansion at different emission radii of plasma spots.

Figure 13

Fig. 13. (Color online) Distribution of relative plasma density at different emission radii of plasma spots.