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Block copolymers with stable radical and fluorinated groups by ATRP

Published online by Cambridge University Press:  03 July 2015

Clemens Liedel
Affiliation:
Materials Science and Engineering, 214 Bard Hall, Cornell University, Ithaca, New York 14853
Austin Moehle
Affiliation:
Applied and Engineering Physics, 271 Clark Hall, Cornell University, Ithaca, New York 14853
Gregory D. Fuchs
Affiliation:
Applied and Engineering Physics, 271 Clark Hall, Cornell University, Ithaca, New York 14853
Christopher K. Ober*
Affiliation:
Materials Science and Engineering, 214 Bard Hall, Cornell University, Ithaca, New York 14853
*
Address all correspondence to Christopher K. Ober atcko3@cornell.edu

Abstract

Polymers with stable radical groups are promising materials for organic electronic devices due to their unique redox activity. Block copolymers with one redox active block could be used in nanostructured devices for electronic applications. We report on the synthesis and characterization of such multifunctional block copolymers in which phase separation on the 10 nm (half pitch) scale is achieved by using fluorinated blocks. Fluorination of one block increases the degree of phase separation and leads to smaller accessible domain sizes. Block copolymers with 60%, 80% and 90% of a stable radical containing block and either fluorinated or non-fluorinated second blocks were made by atom transfer radical polymerization, and their microstructure formation as a function of fluorine content is described after solvent vapor or thermal annealing. Electrical characterization of such a partly fluorinated block copolymer shows their potential for electronic devices.

Information

Type
Polymers/Soft Matter Research Letters
Copyright
Copyright © Materials Research Society 2015 
Figure 0

Scheme 1. Reaction scheme for the polymerization of block copolymers with fluorinated and stable radical groups by ATRP.

Figure 1

Figure 1. 1H NMR spectra of PTMPMA (blue) and PTMPMA-b-P3FEMA (red). The integrated intensities of peaks A, B and C were used to calculate average molecular weight and block ratios. (b) shows a magnification of the blue curve in (a) around δ ≈ 4 ppm.

Figure 2

Table I. Summary of the different block copolymers.

Figure 3

Figure 2. AFM topography (a, c; Δz = 5 nm) and phase (b, d; Δφ = 7.5°) images of PTMPMA-b-PMMA block copolymer films after spin-coating from CH2Cl2 and thermal annealing at 140 °C for 48 h (a, b) or acetone vapor annealing for 3 h in controlled atmosphere (c, d).

Figure 4

Figure 3. AFM topography (a, c; Δz = 5 nm) and phase (b, d; Δφ = 15°) images of PTMPMA-b-P3FEMA block copolymer films after spin-coating from CH2Cl2 and thermal annealing at 140 °C for 48 h (a, b) or acetone vapor annealing for 3 h in controlled atmosphere (c, d).

Figure 5

Figure 4. EPR spectra of PTMPMA-b-P3FEMA (red filled circles) and PTMA-b-P3FEMA (black hollow circles).

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