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Design, modeling and characterization of MMIC integrated cascode cell for compact Ku-band power amplifiers

Published online by Cambridge University Press:  24 May 2013

A. Déchansiaud*
Affiliation:
XLIM, UMR CNRS 6172, 7 rue Jules Valles, 19100 Brive la Gaillarde, France. Phone: +33 561 111 122
R. Sommet
Affiliation:
XLIM, UMR CNRS 6172, 7 rue Jules Valles, 19100 Brive la Gaillarde, France. Phone: +33 561 111 122
T. Reveyrand
Affiliation:
XLIM, UMR CNRS 6172, 7 rue Jules Valles, 19100 Brive la Gaillarde, France. Phone: +33 561 111 122
D. Bouw
Affiliation:
United Monolithic Semiconductors, Batiment Charmille, Parc SILIC de Villebon-Courtaboeuf, 10 avenue du Quebec, 91140 Villebon-sur-Yvette, France
C. Chang
Affiliation:
United Monolithic Semiconductors, Batiment Charmille, Parc SILIC de Villebon-Courtaboeuf, 10 avenue du Quebec, 91140 Villebon-sur-Yvette, France
M. Camiade
Affiliation:
United Monolithic Semiconductors, Batiment Charmille, Parc SILIC de Villebon-Courtaboeuf, 10 avenue du Quebec, 91140 Villebon-sur-Yvette, France
F. Deborgies
Affiliation:
European Space Agency, Keplerlaan 1 - NL 2201 AZ Noordwijk ZH, Netherlands
R. Quéré
Affiliation:
XLIM, UMR CNRS 6172, 7 rue Jules Valles, 19100 Brive la Gaillarde, France. Phone: +33 561 111 122
*
Corresponding author: A. Déchansiaud Email: adeline.dechansiaud@nxp.com
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Abstract

This paper reports on the design of a new power cell dedicated to Ku-band power amplifier (PA) applications. This cell called “integrated cascode” has been designed in order to propose a strong decrease in terms of circuit size for PA. The technology used relies on 0.25-μm GaAs pseudomorphic high electron mobility transistors (PHEMT) of United Monolithic Semiconductors (UMS) foundry. A distributed approach is proposed in order to model this power cell. The challenge consists of obtaining, with a better shape factor (ratio between the vertical and horizontal sizes of the transistor), the same performances than a single transistor with the same gate width. In order to design a 2W amplifier, we have used two 12 × 100 μm transistors. Cascode vertical size is 413 μm whereas a transistor with the same gate width exhibits a vertical size of 790 μm. Therefore, the shape factor is nearly one as compared to a shape factor of 4 for a classical parallel architecture. This new device allows us to decrease the Monolithic microwave integrated circuit amplifier area of 40% compared to amplifier based on single transistors.

Information

Type
Research Papers
Copyright
Copyright © Cambridge University Press and the European Microwave Association 2013 
Figure 0

Fig. 1. Cascode cell topology schematic.

Figure 1

Fig. 2. Cascode cell layout.

Figure 2

Fig. 3. Comparison of S12, Z22, and maximum available gain between an integrated cascode cell and a single transistor with the same gate width.

Figure 3

Fig. 4. [S] parameters measurements of 12 × 125 µm transistor compared with its distributed model composed of six transistors of two gate fingers.

Figure 4

Fig. 5. Load pull measurements of 12 × 125 µm transistor with its distributed model @ 12 GHz for Zload = 13.3 + j17.4 Ω.

Figure 5

Fig. 6. Distributed model of integrated cascode.

Figure 6

Fig. 7. Load cycles of each transistor.

Figure 7

Fig. 8. Rollet factor and delta of [S] parameters matrix.

Figure 8

Fig. 9. Thermal model including self heating and coupling effects.

Figure 9

Fig. 10. Measured and distributed model [S] parameters of a cascode cell in the 0.5 to 30 GHz range (Vdd = 16 V, Ids = 160 mA)

Figure 10

Fig. 11. Measured and modeled power sweep of cascode cell at 12 GHz (Vdd = 16 V, Ids = 160 mA)

Figure 11

Fig. 12. 2W amplifier layout.

Figure 12

Fig. 13. 2W initial amplifier.

Figure 13

Fig. 14. CW measured and distributed power characteristics of the amplifier at 12 GHz (Vdd = 16 V, Ids = 490 mA).

Figure 14

Fig. 15. Pulsed measured power performances, output power, linear gain, and PAE from 12 to 16 GHz (Vdd = 16 V, Ids = 490 mA).

Figure 15

Table 1. Comparison with the state of the art.