Hostname: page-component-74656f9884-rngvg Total loading time: 0 Render date: 2026-11-05T22:03:16.058Z Has data issue: false hasContentIssue false

Defect engineering increases polarization retention in ferroelectric thin films

Published online by Cambridge University Press:  09 April 2020

Abstract

Information

Type
Materials News
Copyright
Copyright © Materials Research Society 2020