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Heat-assisted magnetic recording media materials

Published online by Cambridge University Press:  09 February 2018

K. Hono
Affiliation:
Research Center for Magnetic and Spintronic Materials, National Institute for Materials Science, Japan; kazuhiro.hono@nims.go.jp
Y.K. Takahashi
Affiliation:
Magnetic Recording Materials Group, National Institute for Materials Science, Japan; Takahashi.Yukiko@nims.go.jp
Ganping Ju
Affiliation:
Recording Media Research Center, Seagate Technology, USA; ganping.a.ju@seagate.com
Jan-Ulrich Thiele
Affiliation:
Seagate Technology, USA; jan-ulrich.thiele@seagate.com
Antony Ajan
Affiliation:
Magnetic Recording Media Division, Western Digital Corporation, USA; Antony.Ajan@wdc.com
XiaoMin Yang
Affiliation:
Seagate Technology, USA; XiaoMin.Yang@seagate.com
Ricardo Ruiz
Affiliation:
Western Digital Corporation, USA; ricardo.ruiz@wdc.com
Lei Wan
Affiliation:
Western Digital Corporation, USA; lei.wan@wdc.com

Abstract

Heat-assisted magnetic recording (HAMR) is being developed as the next-generation magnetic recording technology. High anisotropy granular media such as FePt-C have been demonstrated as HAMR media for ∼2 Tbpsi (terabits per in2) recording density. In order for this technology to reach its full potential of 4–5 Tbpsi, more progress and innovations are needed for the key requirements for HAMR media, including microstructure, design, magnetic distribution, and thermal design. Beyond granular media, heated-dot magnetic recording (HDMR) is planned to extend areal density toward 10 Tbpsi. HDMR combines similar advanced recording layer materials with advanced patterning techniques to fabricate <10-nm rectangular dot media.

Information

Type
Materials for Heat-Assisted Magnetic Recording
Copyright
Copyright © Materials Research Society 2018 
Figure 0

Table I. Heat-assisted magnetic recording media requirements for 2 and 4 Tbpsi recording densities.

Figure 1

Figure 1. The ideal structure of a heat-assisted magnetic recording medium for 2 Tbpsi areal density. The L10-FePt grains must grow columnarly separated by a nonferromagnetic segregant. For 2 Tbpsi, column-height-to-grain diameter ratio must be >1.5 and the diameter of the grains must be <4 nm.

Figure 2

Figure 2. Plan-view and cross-sectional transmission electron microscope bright-field images and magnetization curves of FePt-C granular films with nominal thickness, t, of 6 nm and 10 nm. Up to t = 6 nm, the film grows with a single-layer granular structure, but a second granular layer appears for t > 6 nm and the in-plane component in the magnetization increases for t > 6 nm.11

Figure 3

Figure 3. (a–b) Plan-view and cross-sectional transmission electron microscope bright-field images of FePt-30.6 vol% C films deposited by the compositionally graded process to the nominal thickness of 12 nm. The grain aspect ratio is near 2.0. (c) High-angle annular dark-field image showing a well-ordered L10 structure except near the surface. (d) Magnetization curves show perpendicular magnetic anisotropy film with substantial in-plane component. Note: OP, out-of-plane; IP, in-plane.

Figure 4

Figure 4. Plan-view and cross-sectional transmission electron microscope bright-field images of FePt-C granular film on (a) MgO single-crystal and (b) polycrystalline MgO underlayer. Inset: FePt grain-size distribution, unit in nm. The FePt-C magnetic layer was deposited with the concentration graded process of [FePt-48 vol% C (0.25 nm)/FePt (0.15 nm)]25 to obtain the 10-nm nominal thickness of the FePt-C layer. In-plane and out-of-plane magnetization curves of the FePt-C granular film on (a) MgO single-crystal and (b) polycrystalline MgO underlayer.23

Figure 5

Figure 5. (a) Fabrication of submaster templates from e-beam and block copolymer lithography. One template contains circumferential track lines (left), while the second template includes zoned and skewed radial lines (right). After double imprint on a master template, the two patterns intersect forming rectangular islands. Circumferential lines—top-down scanning electron microscope (SEM) images of (b) e-beam resist pattern with a full pitch, LS = 49 nm; (c) guided PS-b-PMMA pattern with a period, L0 = 24.5 nm; (d) Si lines after pattern transfer. Radial lines—top-down SEM images of (f) e-beam resist pattern with LS = 58 nm; (g) alumina lines formed through sequential infiltration synthesis on guided PS-b-PMMA lamellae with L0 = 29 nm; (h) TiO2 spacer lines with full pitch of 14.5 nm formed through self-aligned double patterning. (e, i) Cross-sectional SEM images of a sister sample as shown in (d, h). (j, k) Top-down SEM images of magnetic dots with areal density of 1.4 and 1.6 Tbpsi. Scale bars = 100 nm.33,34