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Size-, shape-, and orientation-dependent properties of SiC nanowires of selected bulk polytypes

Published online by Cambridge University Press:  02 August 2012

Ming Yu*
Affiliation:
Department of Physics and Astronomy, University of Louisville, Louisville, Kentucky 40292
C.S. Jayanthi
Affiliation:
Department of Physics and Astronomy, University of Louisville, Louisville, Kentucky 40292
S.Y. Wu
Affiliation:
Department of Physics and Astronomy, University of Louisville, Louisville, Kentucky 40292
*
a)Address all correspondence to this author. e-mail: m0yu0001@louisville.edu

Abstract

SiC nanowires (NWs) designed from selected bulk polytypes are investigated using quantum mechanics-based simulations (both ab initio and semiempirical methods), and their structure–property relationships examined vis-à-vis their size, shape, and orientation. It is found that 2H–SiC NWs of hexagonal morphology oriented along the <0001> direction are the most stable ones compared to NWs designed using other bulk polytypes (e.g., 3C, 4H, or 6H) and other morphologies (round, square, rhombus, etc.) for diameters with 1 nm < d < 14 nm. Based on the electronic density calculations, it is found that 2H–SiC <0001> NWs exhibit semiconductor-like characteristics (akin to their bulk counterparts), even when their diameters approach 1 nm. On the other hand, SiC NWs designed from 3C, 4H, and 6H bulk polytypes, regardless of their morphology, exhibit gapless features for diameters less than 3.5 nm. Undoubtedly, these novel properties of SiC NWs can be exploited in the fabrication of nanoscale devices.

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Articles
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Copyright © Materials Research Society 2012
Figure 0

FIG. 1. Cross-sectional and side morphologies, respectively, of 3C–SiC NWs cut along <001> (left), <011> (middle), and <111> (right) directions. Orientations and locations of dimers are different in each of these cases, where C–C dimers (Si–Si dimers) are indicated by black (yellow) balls and sticks. In the case of <011>-oriented NWs with hexagonal morphology (Hexagon-1), the dimers are oriented perpendicular to the NW axis and this is more apparent in the side view; in the case of <111>-oriented NWs with hexagonal morphology, the dimers are located at the corners of the hexagon. A circular loop (red) enclosing the dimers is drawn to indicate the location of dimers in each of these cases. The vertical arrows in each wire in the side view denote the orientation of the wire axis.

Figure 1

FIG. 2. Different polytypes, orientations, and shapes of SiC NWs considered in this work. The shapes correspond to different types of cross-sectional morphologies of NWs. In the case of <011>-oriented 3C–SiC NWs, Hexagon-1 (Square-1) and Hexagon-2 (Square-2) refer to hexagon-shaped (square-shaped) cross-sectional morphologies with dimers perpendicular and parallel to the NW axis, respectively. On the other hand, for <111>-oriented 3C–SiC NWs, Hexagon-1 and Hexagon-2 refer to hexagon-shaped cross-sectional morphologies with dimers on the corners and on the edges of the hexagons, respectively. The yellow balls represent Si atoms and the black balls represent carbon atoms.

Figure 2

FIG. 3. The total energy per atom (Etotal) versus the diameter of SiC NWs corresponding to different orientations and morphologies: <001>-oriented 3C–SiC NWs (upper left), <011>-oriented 3C–SiC NWs (upper middle), <111>-oriented 3C–SiC NWs (upper right), <0001>-oriented 2H–SiC NWs (bottom left), <0001>-oriented 4H–SiC NWs (bottom middle), and <0001>-oriented 6H–SiC NWs (bottom right). The notations used to represent different morphologies are provided in the Fig. 2.

Figure 3

TABLE I. The calculated total energy per atom Etotal (eV/atom) is given as a function of its diameter (Å) for several types of SiC NWs: 3C–SiC, 2H–SiC, and 6H–SiC NWs of different morphologies and orientations. The convergence in the value of the total energy per atom was achieved to a tolerance of approximately 10−6 eV/atom.

Figure 4

FIG. 4. The relative energy versus the diameter of SiC NWs corresponding to different orientations and different morphologies (e.g., hexagonal 3C–SiC along the <111> direction, polygonal 3C–SiC along the <001> direction, hexagonal 2H–SiC along the <0001> direction, hexagonal 4H–SiC along the <0001> direction, and hexagonal 6H–SiC along the <0001> direction), calculated using (a) the DFT-based VASP package26–28 for d up to 3.5 nm and (b) the SCED-LCAO method29–31 for d up to 14 nm, respectively. The relative energy is defined as the difference between the total energy per atom of any configuration of the SiC NW and the total energy per atom of the corresponding bulk counterparts.

Figure 5

FIG. 5. Electronic densities of states (EDOS) of (a) polygonal 3C–SiC NWs with <001> orientation and (b) hexagonal 3C–SiC NWs with <111> orientation, respectively using DFT calculations. The numbers in each panel indicate the diameters of the wires. The EDOS of the corresponding bulk counterpart (bulk 3C–SiC) is also plotted at the bottom of each panel for comparison. Note that the energy gap of bulk 3C–SiC (1.42 eV) was underestimated by the DFT calculation (compared to the measured value of 2.39 eV39). The vertical dashed lines are the Fermi levels.

Figure 6

FIG. 6. Electronic densities of states (EDOS) of (a) hexagonal 2H–SiC NWs with <0001> orientation, (b) hexagonal 4H–SiC NWs with <0001> orientation, and (c) hexagonal 6H–SiC NWs with <0001> orientation, respectively, using DFT calculations. The numbers in each panel indicate the diameters of the wires. The EDOS of the corresponding bulk counterparts (i.e., bulk 2H–SiC, 4H–SiC, and 6H–SiC) are plotted at the bottom of each panel for comparisons. Note that the energy gaps of bulk 2H–, 4H–, and 6H–SiC (2.38, 2.28, and 2.07 eV) were underestimated by the DFT calculation (compared to the measured values of 3.3, 3.26, and 3.02 eV39). The vertical dashed lines are the Fermi levels.