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Thermal fluctuations in capillary thinning of thin liquid films

Published online by Cambridge University Press:  14 August 2019

Maulik S. Shah
Affiliation:
Department of Chemical Engineering, Delft University of Technology, van der Maasweg 9, 2629 HZ, Delft, The Netherlands
Volkert van Steijn
Affiliation:
Department of Chemical Engineering, Delft University of Technology, van der Maasweg 9, 2629 HZ, Delft, The Netherlands
Chris R. Kleijn
Affiliation:
Department of Chemical Engineering, Delft University of Technology, van der Maasweg 9, 2629 HZ, Delft, The Netherlands
Michiel T. Kreutzer*
Affiliation:
Department of Chemical Engineering, Delft University of Technology, van der Maasweg 9, 2629 HZ, Delft, The Netherlands
*
†Email address for correspondence: m.t.kreutzer@tudelft.nl

Abstract

Thermal fluctuations have been shown to influence the thinning dynamics of planar thin liquid films, bringing predicted rupture times closer to experiments. Most liquid films in nature and industry are, however, non-planar. Thinning of such films not just results from the interplay between stabilizing surface tension forces and destabilizing van der Waals forces, but also from drainage due to curvature differences. This work explores the influence of thermal fluctuations on the dynamics of thin non-planar films subjected to drainage, with their dynamics governed by two parameters: the strength of thermal fluctuations, $\unicode[STIX]{x1D703}$, and the strength of drainage, $\unicode[STIX]{x1D705}$. For strong drainage ($\unicode[STIX]{x1D705}\gg \unicode[STIX]{x1D705}_{tr}$), we find that the film ruptures due to the formation of a local depression called a dimple that appears at the connection between the curved and flat parts of the film. For this dimple-dominated regime, the rupture time, $t_{r}$, solely depends on $\unicode[STIX]{x1D705}$, according to the earlier reported scaling, $t_{r}\sim \unicode[STIX]{x1D705}^{-10/7}$. By contrast, for weak drainage ($\unicode[STIX]{x1D705}\ll \unicode[STIX]{x1D705}_{tr}$), the film ruptures at a random location due to the spontaneous growth of fluctuations originating from thermal fluctuations. In this fluctuations-dominated regime, the rupture time solely depends on $\unicode[STIX]{x1D703}$ as $t_{r}\sim -(1/\unicode[STIX]{x1D714}_{max})\ln (\sqrt{2\unicode[STIX]{x1D703}})^{\unicode[STIX]{x1D6FC}}$, with $\unicode[STIX]{x1D6FC}=1.15$. This scaling is rationalized using linear stability theory, which yields $\unicode[STIX]{x1D714}_{max}$ as the growth rate of the fastest-growing wave and $\unicode[STIX]{x1D6FC}=1$. These insights on if, when and how thermal fluctuations play a role are instrumental in predicting the dynamics and rupture time of non-flat draining thin films.

Information

Type
JFM Papers
Creative Commons
Creative Common License - CCCreative Common License - BY
This is an Open Access article, distributed under the terms of the Creative Commons Attribution licence (http://creativecommons.org/licenses/by/4.0/), which permits unrestricted re-use, distribution, and reproduction in any medium, provided the original work is properly cited.
Copyright
© The Author(s) 2019
Figure 0

Figure 1. Schematic of a non-flat draining thin film subjected to thermal fluctuations, with the film thickness parameterized by $h(x,t)$. (a) The initial film shows a curved part extending from $-l_{1}\leqslant x<0$ with the pressure given by the Laplace pressure,$p=-\unicode[STIX]{x1D6FE}/r$, with $1/r$ as the curvature imposed at the edge. This curved part is connected to a flat part extending from $0\leqslant x\leqslant l_{2}$ with the pressure given by the van der Waals component of the disjoining pressure, $p=A/6\unicode[STIX]{x03C0}h^{3}$. Besides curvature-induced drainage, the film is also subjected to thermal fluctuations of the free interface, resulting in thickness variations of amplitude ${\sim}\sqrt{k_{B}T/\unicode[STIX]{x1D6FE}}$. The dashed line at $x=l_{2}$ signifies the symmetry in the system. (b) Shape upon rupture, highlighting that film thinning stems from two competing mechanisms: (1) the formation of a localised dimple due to curvature-induced drainage and (2) the spontaneous growth of waves originating from thermal fluctuations.

Figure 1

Figure 2. Film dynamics for $\unicode[STIX]{x1D705}=0.1$, i.e. close to the transition curvature where the time scale for rupture due to drainage is comparable to the time scale for rupture due to the spontaneous growth of fluctuations. (a) Film evolution in space (zoomed here close to $x\sim 0$) and time (for $t=0$, 1.37, 3.00, 3.14) for noise-free (deterministic) simulation ($\unicode[STIX]{x1D703}=0$). (b) Single realisation of the noise-inclusive counterpart of (a) for $\unicode[STIX]{x1D703}=0.001$. The insets in (a) and (b) show the time evolution of the minimum film height, $h_{min}$. (c) Film evolution for 400 realizations of the same simulations as in (b), with the minimum film heights being extrapolated from their last recorded ($h_{min}\lesssim 0.05$) values to 0. The insets represent the distributions of times required to reach the three indicated heights, one in early drainage-governed stage, a second at the late disjoining pressure-governed stage, and a third at the crossover of these stages. (d) Standard deviation in the time required to reach a given minimum height as obtained from the 400 realizations of (c).

Figure 2

Figure 3. Comparison between films with high ($\unicode[STIX]{x1D705}\gg \unicode[STIX]{x1D705}_{tr}$, dimple-dominated) and low ($\unicode[STIX]{x1D705}\ll \unicode[STIX]{x1D705}_{tr}$, fluctuations-dominated) curvature, without ($\unicode[STIX]{x1D703}=0$) and with realistic ($\unicode[STIX]{x1D703}=0.001$) noise. (a) Evolution of film heights in the dimple region for $\unicode[STIX]{x1D705}=50$ for a deterministic simulation, at various dimensionless times $t=(0.01,0.03,0.08,0.16,0.28,0.45,0.75,1.3,2.1,2.5)\times 10^{-3}$ (also reported in Kreutzer et al. (2018)); (b) evolution of film heights in the dimple region for $\unicode[STIX]{x1D705}=50$ for a single realization of a stochastic simulation, at various dimensionless times $t=(0.01,0.02,0.07,0.14,0.28,0.5,0.87,1.4,2.0,2.3)\times 10^{-3}$. (c) evolution of film heights for $\unicode[STIX]{x1D705}=0.001$ for deterministic simulations, at various dimensionless times, $t=(7,10,13.6,14.7,15.2,15.5,15.55,15.58,15.6)$; (d) evolution of film heights for $\unicode[STIX]{x1D705}=0.001$ for a single realization of a stochastic simulation at various dimensionless times, $t=(1.6,3,5.04,5.7,6.16,6.27,6.37)$. The insets in (a–d) show the corresponding time evolutions of the minimum film height.

Figure 3

Figure 4. Comparison of rupture location between noise-free ($\unicode[STIX]{x1D703}=0$) and noise-inclusive ($\unicode[STIX]{x1D703}=0.001$) evolutions as a function of curvature. The rupture locations for the noise-inclusive evolutions are illustrated as individual data points for 100 out of 400 realizations. The rupture locations for $\unicode[STIX]{x1D703}=0$ and $\unicode[STIX]{x1D703}=0.001$ are shifted horizontally for better visibility.

Figure 4

Figure 5. (a) Dependence of rupture time on drainage ($\unicode[STIX]{x1D705}$) and noise strength ($\unicode[STIX]{x1D703}$). Two clearly separated regimes are visible wherein film thinning is dominated by dimple formation for high curvatures ($\unicode[STIX]{x1D705}\gg \unicode[STIX]{x1D705}_{tr}$) or by the growth of fluctuations for low curvatures ($\unicode[STIX]{x1D705}\ll \unicode[STIX]{x1D705}_{tr}$). Inset: rupture times rescaled with $1/\unicode[STIX]{x1D714}_{max}$ at $\unicode[STIX]{x1D705}=1\times 10^{-5}$ (highlighted by the ellipse) for different noise strengths. The observed slope is close to $-1$ as indicated by the triangle. We excluded the rupture time for the noise strength of $\unicode[STIX]{x1D703}=0.04$ in the fit, because the fluctuations of the interface ${\sim}\sqrt{2\unicode[STIX]{x1D703}}$ are approximately $30\,\%$ of the initial film thickness and the time for them to develop into the fastest-growing wave with $\unicode[STIX]{x1D714}_{max}=1/4$ is significantly longer than the film rupture time itself. (b) Transition curvature, $\unicode[STIX]{x1D705}_{tr}$, from dimple-dominated rupture to fluctuations-dominated rupture versus noise strength, with the inset showing how $\unicode[STIX]{x1D705}_{tr}$ is calculated based on the film rupture times.

Figure 5

Figure 6. Dependence of rupture time on the extent of the flat portion of the film, $l_{2}$ for $\unicode[STIX]{x1D703}=0.001$ and $\unicode[STIX]{x1D705}=10^{-5}$.

Figure 6

Figure 7. Dependence of rupture time on grid and time step size for noise-inclusive simulations ($\unicode[STIX]{x1D703}=0.001$) for (a) $\unicode[STIX]{x1D705}=10^{-5}$ and (b) $\unicode[STIX]{x1D705}=10^{3}$. Error bars were horizontally shifted for better visibility.

Figure 7

Figure 8. Statistical significance based on the number of realizations. Mean rupture times ($\unicode[STIX]{x1D707}_{tr}$) (a,b) and corresponding standard deviation ($\unicode[STIX]{x1D70E}_{tr}$) (c,d) as a function of the number of realizations randomly picked from a pool of 400 noise-inclusive simulations ($\unicode[STIX]{x1D703}=0.001$) for $\unicode[STIX]{x1D705}=10^{-5}$ (a,c) and $\unicode[STIX]{x1D705}=10^{3}$ (b,d). The dashed red lines indicate 5 % deviation from the values of mean and standard deviation for the entire pool.