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On the mechanism of secondary pop-out in cyclic nanoindentation of single-crystal silicon

Published online by Cambridge University Press:  12 May 2015

Hu Huang
Affiliation:
Department of Mechanical Engineering, Keio University, Yokohama 223-8522, Japan
Jiwang Yan*
Affiliation:
Department of Mechanical Engineering, Keio University, Yokohama 223-8522, Japan
*
a)Address all correspondence to this author. e-mail: yan@mech.keio.ac.jp

Abstract

In cyclic nanoindentation of single-crystal silicon, an interesting phenomenon of a secondary pop-out event that closely follows the first pop-out event but with a larger critical load than the first is presented. Cyclic nanoindentation experiments under various loading/unloading rates and various maximum indentation loads were performed to verify the generality of the phenomenon of two pop-out events. Raman spectroscopy results indicate that the secondary pop-out does not induce any new phase, and the dominated end phases after the two pop-out events are still a mixture of Si-XII/Si-III phases. According to average contact pressure analysis, the phase transformation paths and the formation mechanism for the secondary pop-out event are discussed from the viewpoint of crystal nucleation and growth. The results indicate that phase transformations from the Si-I phase to Si-XII/Si-III phases are completed by two pop-out events in two adjacent indentation cycles, and the Si-XII/Si-III phases formed in previous indentation cycles strongly affect the phase transformations in subsequent loading/unloading processes.

Information

Type
Articles
Copyright
Copyright © Materials Research Society 2015 
Figure 0

FIG. 1. Load–displacement curves of c-Si under a maximum indentation load of 50 mN and a loading/unloading rate of 5 mN/s: (a) a single indentation cycle with a pop-out in the unloading curve; (b) a single indentation cycle with an elbow in the unloading curve; (c) and (d) ten indentation cycles.

Figure 1

FIG. 2. Load–displacement curves of c-Si under various maximum indentation loads: (a) and (b) 10 mN; (c) and (d) 30 mN; and (e) and (f) 100 mN.

Figure 2

FIG. 3. Load–displacement curves of c-Si under the same maximum indentation load of 50 mN but different loading/unloading rates: (a) and (b) 0.5 mN/s and (c) and (d) 25 mN/s.

Figure 3

FIG. 4. Raman spectra curves: (a) corresponds to the pristine silicon, (b) corresponds to Fig. 1(a), (c) corresponds to Fig. 1(b), (d) corresponds to Fig. 1(c), (e) corresponds to Fig. 1(d), (f) corresponds to Fig. 3(a), (g) corresponds to Fig. 2(c), and (h) corresponds to Fig. 2(e). The experimental conditions are indicated in the figures.

Figure 4

FIG. 5. ACP versus indentation displacement curves of cyclic nanoindentations: (a) first and second cycles in case 1 and (b) first to fourth cycles in case 2.

Figure 5

FIG. 6. The possible phase transformation paths of c-Si from the Si-I phase into a mixture of Si-XII/Si-III phases for (a) case 1 and (b) case 2 based on the crystal nucleation and growth mechanism. ↑ and ↓ denote loading and unloading processes, respectively. The heights of the rectangles quantitatively denote the volume fractions of the corresponding phases.