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Piezoelectricity in non-nitride III–V nanowires: Challenges and opportunities

Published online by Cambridge University Press:  27 February 2018

Yonatan Calahorra
Affiliation:
Department of Materials Science and Metallurgy, University of Cambridge, Cambridge CB3 0FS, U.K.
Sohini Kar-Narayan*
Affiliation:
Department of Materials Science and Metallurgy, University of Cambridge, Cambridge CB3 0FS, U.K.
*
a) Address all correspondence to this author. e-mail: sk568@cam.ac.uk

Abstract

The increasing demand for portable and low-power electronics for applications in self-powered devices and sensors has spurred interest in the development of efficient piezoelectric materials, via which mechanical energy from ambient vibrations can be transformed into electrical energy for autonomous devices, or which can be used in strain-sensitive applications. Semiconducting piezoelectric materials are ideal candidates in the emerging field of piezotronics and piezophototronics, where the development of a piezopotential in response to stress/strain can be used to tune the band structure of the semiconductor and hence its electronic and/or optical properties. Furthermore, research into nanowires of these materials has intensified due to the enhancement of piezoelectric properties at the nanoscale. In this regard, nanowires of ZnO and the III-nitrides have been extensively studied, but the piezoelectric properties of non-nitride III–V semiconductor nanowires remain less-explored. Indeed, direct measurements of the piezoelectric properties of single III–V nanowires are tellingly rare due to the difficulties associated with measurements of piezoelectric properties of nanoscale objects using conventional scanning probe microscopy techniques. This review addresses the challenges related to the study of piezoelectricity in III–V nanowires and the opportunities that lie therein in terms of device applications.

Information

Type
Invited Review
Copyright
Copyright © Materials Research Society 2018 
Figure 0

FIG. 1. Web of Science topical publication data: (a) “Nanogenerator” versus “Piezoelectric + Nanogenerator”; (b) “Nanowire” versus “InP + Nanowire OR InAs + Nanowire OR GaAs + Nanowire OR GaP + Nanowire”; and (c) “Piezotronic” versus “Piezotronic + GaN OR Piezotronic + ZnO”.

Figure 1

FIG. 2. Schematic describing the piezotronic effect: (a) and (b) show a piezoelectric semiconductor in contact with a metal, such that compression (a) and tension (b) of the semiconductor give rise to uncompensated surface charge at the Schottky interface—modulating the barrier height. Reprinted with permission from Elsevier.15

Figure 2

FIG. 3. Crystal phase control in III–V NWs: (a) switching from WZ to ZB by increasing growth precursor flow for GaAs, InAs, InP, and GaP. Reprinted with permission from ACS44; (b) High resolution transmission electron microscopy (HR-TEM) image showing the phase purity around the GaAs crystal phase interface. Reprinted with permission from ACS44; and (c) schematic corresponding to the interface in (c).

Figure 3

TABLE I. The piezoelectric coefficients of III–V materials for ZB 〈111〉 orientation and for WZ.

Figure 4

FIG. 4. Experimentally obtained elastic modulus values for WZ GaAs and InP NWs. (a) TEM and finite-element analogue for compression of GaAs NWs (left) and axial Young’s modulus results for NWs w/wo stacking faults (right). Reprinted with permission from ACS64; (b) schematic of inclined InP NW bending (inset) and axial Young’s modulus results for NW w/wo stacking faults. Reprinted with permission from ACS60; and (c) schematic of the optical pump-probe setup (left) and extracted versus theoretical stiffness coefficients for WZ GaAs NWs. Reprinted with permission from ACS.65

Figure 5

FIG. 5. Internal piezoelectric effects: (a) schematic structure (top) and calculated conduction band of the InP/InAs double barrier resonant tunneling diode structure, with self-consistent solution containing the piezoelectric fields in the structure. Reprinted with permission from AIP74; (b) TEM showing an InAs quantum rod embedded within an InP NW (left) and Stark effect characteristic low excitation blue shift measured in these structures (right). Reprinted with permission from AIP.75

Figure 6

FIG. 6. Externally applied electromechanical effects: (a) WZ InAs NW piezotronics. Electron microscopy-based stretching scheme (top left), I–V curves for various strain levels (top right), schematic band diagram (bottom left), and electromechanical gauge factor for two strain levels (bottom right). Reprinted with permission from Wiley79; (b) ZB/WZ InAs NW piezoresistive effect. Left and right show compression experiments on ZB and WZ NWs, correspondingly. The graphs below show the consequent strain related current levels. Reprinted with permission from ACS.80

Figure 7

FIG. 7. The piezoelectric properties of GaAs NW ensembles: (a) experimentally measured electromechanical coupling as a function of NW density; (b) finite element simulation of the pressure force enhancement effect; (c) simulation of the intra-NW medium, recreating the NW density effect. Reprinted with permission from Wiley.86

Figure 8

FIG. 8. The piezoelectric properties of single III–V NWs probed by PFM: (a) horizontally measured ZB GaAs NW (scheme—top left and AFM capture—top middle), where the results from finite element simulations (left) successfully recreated the experimentally obtained lateral and vertical PFM signals (bottom middle and right); (b) vertically aligned WZ InP NWs (AFM capture—top, PFM scanned NWs—inset) and the resulting PFM from the substrate and the NW (bottom), used to extract a d33 value. Reprinted with permission from IOP.1