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Size-dependent lattice parameters of microstructure-controlled Sn nanowires

Published online by Cambridge University Press:  29 July 2011

Ho Sun Shin
Affiliation:
Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology, Daejeon 305-701, Republic of Korea
Jin Yu
Affiliation:
Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology, Daejeon 305-701, Republic of Korea
Jae Yong Song*
Affiliation:
Division of Industrial Metrology, Korea Research Institute of Standards and Science, Daejeon 305-340, Republic of Korea; and University of Science and Technology, Daejeon 305-333, Republic of Korea
Hyun Min Park
Affiliation:
Division of Industrial Metrology, Korea Research Institute of Standards and Science, Daejeon 305-340, Republic of Korea; and University of Science and Technology, Daejeon 305-333, Republic of Korea
*
a)Address all correspondence to this author. e-mail: jysong@kriss.re.kr

Abstract

The size dependence of the lattice parameter of nanosolids has extensively been studied because lattice strain engineering is important in controlling the physical properties of nanowires (NWs), such as band gap, carrier transport, mechanical strength, etc. We have investigated the size-dependent lattice behavior of microstructure-controlled Sn NWs with radii of 7–35 nm. The NW microstructures were controlled as single-crystal, granular, and bamboo structures in the longitudinal direction. Results showed that the a-axis lattice parameter in the [100]-longitudinal direction of NWs can be controlled within 1% by varying the wire microstructure for the same wire radius because it is strongly dependent on the microstructure and the wire radius. Moreover, as the randomness of the grain orientation in the microstructure-controlled NWs increases, by which the anisotropy of surface stress is effectively reduced, the lattice strain of the NW can be compressive or tensile as a function of the wire radius. The longitudinal lattice parameters of microstructure-controlled Sn NWs can be tailored by reducing the effective anisotropy of surface stresses under a dimension confinement in the nanometer scale.

Information

Type
Articles
Copyright
Copyright © Materials Research Society 2011
Figure 0

FIG. 1. X-ray diffraction (XRD) patterns of (a) single crystalline Sn nanowires (NWs) of rNW = 18 nm that were deposited into oxalic anodic aluminum oxide (AAO) templates under a cathodic potential of Ec = −10 V, (b) single crystalline Sn NWs of rNW = 20 nm that were deposited into sulfuric AAO templates under a cathodic potential of Ec = −6 V, (c) granular Sn NWs with rNW = 25 nm that were deposited into oxalic AAO templates under a cathodic potential of Ec = −6 V, (d) randomly orienting bamboo Sn NWs with rNW = 25 nm, and (e) preferentially orienting bamboo Sn NWs with rNW = 9 nm after heat treating single crystalline Sn NWs. The upper inset shows a schematic where the x-ray beam was incident on the NWs and Si powders. The right insets show schematic of the microstructure-controlled NWs corresponding to the XRD patterns, respectively. The yellow color indicates a grain with the [200]-longitudinal direction and the other colors indicate grains with other orientations. The dashed lines denote each Bragg diffraction angle (2θ) of bulk β-Sn crystal.

Figure 1

FIG. 2. Typical (a) Field emission-scanning electron microscopy and (b) Transmission electron microscopy (TEM) images of single crystalline Sn NWs with rNW = 18 nm. In (a), the lighter and darker images denote the Sn NWs and AAO template, respectively. The selected area electron diffraction pattern and high-resolution TEM (HRTEM) image are shown in the insets of Fig. 2(b).

Figure 2

FIG. 3. (a) Bright-field TEM image and (b) HRTEM image of single crystalline Sn NWs (rNW = 20 nm) with a low-angle tilt boundary. The fast Fourier transform (FFT) images corresponding to the grains denoted as i and ii in the HRTEM image are shown on the right, respectively.

Figure 3

FIG. 4. (a) Bright-field TEM, (b) dark-field TEM, and (c) HRTEM images of granular Sn NWs with rNW = 25 nm. The FFT images corresponding to each grain denoted as i, ii, and iii in the HRTEM image are shown in the lower insets, respectively.

Figure 4

FIG. 5. Typical HRTEM images of randomly orienting bamboo Sn NWs with rNW = 25 nm. The magnified lattice images and FFT images corresponding to each bamboo grain denoted as i, ii, iii, and iv are shown in the upper and lower insets, respectively.

Figure 5

FIG. 6. (a) Bright-field TEM image of preferentially orienting bamboo Sn NWs with rNW = 9 nm at lower magnification. The boundaries between bamboo grains are denoted by yellow arrows. (b) Magnified HRTEM image of the squared marking area (in red) in (a). The right insets in (b) show the FFT images corresponding to the grains denoted as i and ii, respectively.

Figure 6

FIG. 7. Variations of longitudinal lattice strain (ε) in the [100] direction with the NW radii and NW microstructures: (a) single crystalline, (b) granular, and (c) bamboo structures. Solid and open circles: single crystal NWs deposited at Ec = −10 V; open squares: single crystal NWs with low-angle tilt boundaries deposited at Ec = −6 V; solid squares: granular NWs deposited at Ec = −6 V; and triangles: Sn NWs after heat treating at 573 K. Solid and open symbols denote the NWs deposited into oxalic and sulfuric AAO templates, respectively.