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Organic resistive nonvolatile memory materials

Published online by Cambridge University Press:  17 February 2012

Takhee Lee
Affiliation:
Department of Physics and Astronomy, Seoul National University, Korea; tlee@snu.ac.kr
Yong Chen
Affiliation:
University of California, Los Angeles, USA; yongchen@seas.ucla.edu

Abstract

Resistive memory devices based on organic materials that can be configured to two or more stable resistance states have been extensively explored as information storage media due to their advantages, which include simple device structures, low fabrication costs, and flexibility. Various organic-based materials such as small molecules, polymers, and composite materials have been observed to show bistability. This review provides a general summary about the materials, structures, characteristics, and mechanisms of organic resistive memory devices. Several critical strategies for device fabrication, performance enhancement, and integrated circuit architectures are also discussed.

Information

Type
Research Article
Copyright
Copyright © Materials Research Society 2012
Figure 0

Figure 1. Typical structures of organic memory cells: (a) a single-layer structure without nanoparticles (NPs), (b) a bilayer structure containing two kinds of polymers, (c) a structure with nano-traps buried in the middle of an organic layer, and (d) a polymer-NP composite with NP traps randomly distributed throughout the entire host polymer.3

Figure 1

Figure 2. Schematics to illustrate the mechanisms for organic resistive switching induced by (a) filamentary conduction (M represents metal, and I represents insulator),88 (b) space-charge-limited-conduction (where red dots represent electrons), (c) charge transfer-based conduction,89 and (d) conformation change-based switching induced by changes in electric field polarity.90

Figure 2

Figure 3. Switching characteristics of WPF-oxy-F organic memory devices. (a) I–V characteristics (left) and ON/OFF ratio of resistances (right) are shown as a function of the applied voltage bias.24 (b) Cumulative probability of the device resistances at their low resistance state (LRS) and high resistance state (HRS) measured from an 8 × 8 crossbar memory circuit.61 (c) Switching cycles of currents through a resistive switching device modified by consecutive voltage pulses. The device ON and OFF states were alternated with a 5 V pulse (writing process) and a −4 V voltage pulse (erasing process) with pulse duration times of 10 ms and 200 ms, respectively.62 (d) The retention characteristics of a resistive switching device at its LRS and HRS (PoRAM: polymer random access memory).63 The chemical structure of WPF-oxy-F is shown in the inset of (a).

Figure 3

Figure 4. (a) The crossbar structure of an organic memory circuit. (b) Schematic showing a 3D stacked organic resistive memory assembly. 192 memory cells were produced within three active layers (as shown in the transmission electron microscopy image inset) sandwiched between pairs of Al electrodes.73 The chemical structures of polyimide (PI) and 6-phenyl-C61 butyric acid methyl ester (PCBM) are also shown in the inset. (c) A schematic illustrating a direct metal-transfer (DMT) fabricated crossbar array memory circuit with a unit cell size of 100 nm × 100 nm.77 (d) A schematic and a photograph of flexible organic memory circuits that consist of a resistive switchable PI:PCBM layer sandwiched between a multilayer graphene film as the top electrode and Al as the bottom electrode (scale bar: 1 cm).84