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Diffusion behavior of Sn atoms in Sn58Bi solder joints under the coupling effect of thermomigration and electromigration

Published online by Cambridge University Press:  15 April 2016

Fu Guo*
Affiliation:
College of Materials Science and Engineering, Beijing University of Technology, Beijing, 100124, People's Republic of China
Qian Liu*
Affiliation:
College of Materials Science and Engineering, Beijing University of Technology, Beijing, 100124, People's Republic of China
Limin Ma*
Affiliation:
College of Materials Science and Engineering, Beijing University of Technology, Beijing, 100124, People's Republic of China
Yong Zuo*
Affiliation:
College of Materials Science and Engineering, Beijing University of Technology, Beijing, 100124, People's Republic of China
*
a)Address all correspondence to these authors. e-mail: malimin@bjut.edu.cn

Abstract

Thermomigration (TM) and electromigration (EM) are two persistent reliability issues and they generally appear concurrently in solder joints. Many previous studies have attempted to understand the fundamental principles behind these phenomena with the majority of which focusing their interest into the faster migration elements in solders like Bi, Ni, or Cu. However, Sn as the slower migration element has not received that much attention. In the present study, a special linearly symmetrical structure was used. An unusual TM phenomenon of Sn atoms in the Sn58Bi solder joint was observed. The unusual TM of Sn atoms along the vertical edges was attributed to the coupled effect of the EM in the horizontal direction and the TM in vertical direction. The relationships between the microstructural characteristics and the temperature distribution were established. The results also indicated that elevated temperature and sufficient thermal gradient were the two major factors that caused TM.

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Articles
Copyright
Copyright © Materials Research Society 2016 
Figure 0

FIG. 1. Configurations and FEM simulations of type A and type B samples: (a and b) schematics of solder joints and (c and d) temperature distribution.

Figure 1

FIG. 2. Microstructural evolution and temperature distribution of a type A sample at room temperature: (a and b) as-reflowed; (c and d) 10 d; (e and f) 25 d.

Figure 2

FIG. 3. Microstructural evolution and temperature distribution of a type A sample at 50 °C: (a and b) as-reflowed; (c and d) 42 h; (e and f) 45 h.

Figure 3

FIG. 4. Microstructural evolution and temperature distribution of a type B sample at 50 °C: (a and b) as-reflowed; (c and d) 42 h; (e and f) 45 h.

Figure 4

TABLE I. Average thermal gradient at the as-reflowed samples.

Figure 5

FIG. 5. Schematic drawing of (a) EM and (b) TM in Sn58Bi solder joint.

Figure 6

FIG. 6. Microstructures at anode side: (a) as-reflowed; (b) type A sample exposure to room temperature for 25 d; (c and d) type A and type B samples exposed to 50 °C for 45 h, respectively.