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Magnetization processes in electrodeposited NiFe/Cu multilayered nanowires

Published online by Cambridge University Press:  27 April 2011

Spyros Krimpalis*
Affiliation:
National Institute of Research and Development for Technical Physics, 700050 Iasi, Romania; and Faculty of Physics, “Alexandru Ioan Cuza” University, 700506 Iasi, Romania
Oana-Georgiana Dragos
Affiliation:
National Institute of Research and Development for Technical Physics, 700050 Iasi, Romania
Anca-Eugenia Moga
Affiliation:
National Institute of Research and Development for Technical Physics, 700050 Iasi, Romania
Nicoleta Lupu
Affiliation:
National Institute of Research and Development for Technical Physics, 700050 Iasi, Romania
Horia Chiriac
Affiliation:
National Institute of Research and Development for Technical Physics, 700050 Iasi, Romania
*
a)Address all correspondence to this author. e-mail: skrimpalis@phys-iasi.ro

Abstract

The effect of the magnetic anisotropy and the dipolar interactions between NiFe magnetic layers and between nanowires on the magnetic properties of NiFe/Cu multilayered nanowire arrays electrodeposited into the nanopores of anodic aluminium oxide (AAO) templates with diameters of 35 and 200 nm has been studied. The variation of the aspect ratio (thickness/diameter) between the NiFe magnetic and Cu nonmagnetic layers influences the effective anisotropy field. The correlation between the measured hysteresis loops, with the applied field parallel and perpendicular to the multilayered nanowires’ axis, and the calculated effective anisotropy field, Heff, and saturation field, Hsat, shows that it is possible to tune the orientation of the magnetization axis with high accuracy. Two formulas, which include both the intra- and internanowire interactions, were proposed to calculate the saturation fields of multilayered nanowire arrays for the applied field parallel and perpendicular to the nanowires’ axis.

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Articles
Copyright
Copyright © Materials Research Society 2011
Figure 0

FIG. 1. Scanning electron microscope image of [NiFe (50 nm)/Cu (10 nm)] × n electrodeposited multilayered nanowires.

Figure 1

FIG. 2. X-ray diffraction patterns of [NiFe (50 nm)/Cu (10 nm)] × n electrodeposited multilayered nanowires with d = 35 nm and d = 200 nm, respectively.

Figure 2

FIG. 3. (a) Schematic representation of a small region of a template and a nanowire grown inside a pore; (b) illustration of the electrochemical deposition technique; (c) the steps followed from the fabrication until the measurements of the nanowires.

Figure 3

FIG. 4. Heff for multilayered nanowires’ arrays, as a function of the thickness of the NiFe layer, for three different Cu spacer layer thicknesses: (a) nanowires with d = 200 nm and (b) nanowires with d = 35 nm.

Figure 4

FIG. 5. Experimental hysteresis loops (normalized) of NiFe/Cu multilayered nanowires with diameters of 200 nm, for applied field parallel and perpendicular to the nanowire axes: (a) for 50-nm thick NiFe and 10-nm thick Cu and (b) for 20-nm NiFe and 10-nm Cu. The calculated values of the saturation field, Hsat, for applied field parallel and perpendicular to the nanowire axis are also shown for comparison.

Figure 5

FIG. 6. Experimental hysteresis loops (normalized) of NiFe/Cu multilayer nanowires with diameters of 35 nm, for applied field parallel and perpendicular to the nanowire axes: (a) for 50-nm thick NiFe and 10-nm thick Cu and (b) for 20-nm thick NiFe and 10-nm thick Cu. The calculated values of the saturation field, Hsat, for applied field parallel and perpendicular to the nanowires’ axis are also shown for comparison.

Figure 6

FIG. 7. The calculated saturation field, Hsat, as a function of the thickness of the Cu layer (open circles) and NiFe layer (solid squares), for multilayered nanowires with diameters of 200 and 35 nm, respectively: for d = 200 nm and applied field (a) parallel and (b) perpendicular to the nanowires’ axis; for d = 35 nm and applied field (c) parallel and (d) perpendicular to the nanowires’ axis.