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Effects of a magnetic field applied during electroplating on the texture and magnetic properties of Ni nanowire arrays

Published online by Cambridge University Press:  07 October 2013

Z. Liu
Affiliation:
School of Materials Science and Engineering, Harbin Institute of Technology, Harbin 150001, P.R. China
W. Li
Affiliation:
School of Materials Science and Engineering, Harbin Institute of Technology, Harbin 150001, P.R. China
D. Xu
Affiliation:
School of Materials Science and Engineering, Harbin Institute of Technology, Harbin 150001, P.R. China
W.-D. Fei*
Affiliation:
School of Materials Science and Engineering, Harbin Institute of Technology, Harbin 150001, P.R. China
P.P. Jin
Affiliation:
School of Mechanical Engineering, Qinghai University, Qinghai 810016, P.R. China
*
a)Author to whom correspondence should be addressed. Electronic mail: wdfei@hit.edu.cn

Abstract

Ni nanowire arrays were prepared by electroplating using anodic aluminum oxide templates, and a magnetic field was applied during the electroplating process. The effects of an applied magnetic field on the texture and magnetic properties of the Ni nanowire arrays were studied. The results show that the (110) texture is formed in the nanowires prepared in different magnetic fields. However, the applied magnetic field during electroplating can affect the texture degree, and there exists a suitable magnetic field for small diffusion degree of the (110) texture. On the basis of texture characterization, the effects of applied magnetic field on the magnetic properties of Ni nanowire arrays are discussed.

Information

Type
Technical Articles
Copyright
Copyright © International Centre for Diffraction Data 2013 
Figure 0

Figure 1. Schematic diagram of the electroplating process.

Figure 1

Figure 2. Backscattering electronic SEM images of Ni nanowires deposited in different magnetic fields applied during electroplating, with the insets being high-magnification images: (a) 0 Oe, (b) 600 Oe, (c) 1200 Oe, and (d) 2400 Oe.

Figure 2

Figure 3. θ–2θ scan XRD curves (a) and FWHM values (b) of the (220) diffraction peaks for Ni nanowires with different magnetic fields (Hp) applied during electroplating.

Figure 3

Figure 4. ω-scan XRD curves of (220) texture in nanowires deposited in different magnetic fields applied during electroplating: (a) 0 Oe, (b) 600 Oe, (c) 1200 Oe, and (d) 2400 Oe, whereas (e) is the relationship between integral widths (w) of the ω-scan XRD peaks and Hp.

Figure 4

Figure 5. Magnetic hysteresis loops of nanowires deposited in different magnetic fields applied during electroplating: (a) 0 Oe, (b) 600 Oe, (c) 1200 Oe, and (d) 2400 Oe.

Figure 5

Figure 6. Partial hysteresis loops (a) in the first quadrant of the hysteresis loops measured parallel to the long axis of the nanowires and (b) the Mr/Ms vs. Hp curve.

Figure 6

Figure 7. Values of the square ratio between parallel and perpendicular directions (S∥/S⊥) vs. Hp.