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Fabrication of nanoperforated ultrathin TiO2 films by inkjet printing

Published online by Cambridge University Press:  14 July 2015

Qian Xu*
Affiliation:
Center for Functional Materials, Laboratory of Physical Chemistry, Faculty of Science and Engineering, Åbo Akademi University, Turku 20500, Finland
Jan-Henrik Smått
Affiliation:
Center for Functional Materials, Laboratory of Physical Chemistry, Faculty of Science and Engineering, Åbo Akademi University, Turku 20500, Finland
Jouko Peltonen
Affiliation:
Center for Functional Materials, Laboratory of Physical Chemistry, Faculty of Science and Engineering, Åbo Akademi University, Turku 20500, Finland
Petri Ihalainen
Affiliation:
Center for Functional Materials, Laboratory of Physical Chemistry, Faculty of Science and Engineering, Åbo Akademi University, Turku 20500, Finland
*
a) Address all correspondence to this author. e-mail: qxu@abo.fi

Abstract

Fabrication of nanoperforated TiO2 thin films (NP-TiO2) on various substrates utilizing evaporation-induced self-assembly has been widely reported during recent years. For many applications, such as solar cells and gas sensors, it would be beneficial if the active material could be deposited onto a desired area or in the form of a pattern or array. In this study, inkjet printing was successfully used to produce NP-TiO2 at both ambient temperature and 60 °C. Especially for intermediate drop spacings (40 and 50 µm), millimeter-sized homogeneous NP-TiO2 patches were obtained with similar NP structure as those being processed by dip coating and drop casting. Compared to ambient temperature, inkjet printing at 60 °C provides a narrower height distribution of the NP structures of about 5 nm. Compared to dip coating and drop casting, inkjet printing enables the deposition of the ink onto target areas, thus enabling the fabrication of microscale arrays and other patterned structures.

Information

Type
Articles
Copyright
Copyright © Materials Research Society 2015 
Figure 0

FIG. 1. AFM images of dip-coated structures using (a) unmodified precursor solution, (b) ink with 5 vol% BE, (c) ink with 20 vol% BE, and (d) drop-cast ink with 20 vol% BE. The dark–light height scale corresponds to 10 nm.

Figure 1

TABLE I. Morphological parameters obtained from AFM image analysis of NP-TiO2 films prepared by dip coating, drop casting, and inkjet printing at ambient temperature.

Figure 2

FIG. 2. (a) A microscope image of an inkjet-printed single droplet with DS 150 µm; AFM images of an inkjet-printed single droplet with DS 200 µm: (b) a part of a single printed TiO2 droplet, 40 µm × 15 µm, (c) zoom in on the edge, 5 µm × 5 µm, (d) zoom in on the center, 5 µm × 5 µm, and (e) a line profile from center to the edge, corresponding to the blue line in Fig. 2(b).

Figure 3

FIG. 3. Microscope images of TiO2 structures prepared by (a) drop casting and by inkjet printing with DS, (b) 5 µm, (c) 10 µm, (d) 20 µm, (e) 30 µm, (f) 40 µm, and (g) 50 µm at ambient temperature; AFM images for (h) thinner (thickness = 9.5 nm) and (i) thicker (thickness = 31.4 nm) regions of Fig. 3(c), respectively.

Figure 4

FIG. 4. AFM images of NP-TiO2 films prepared by inkjet printing with DS (a) 5 µm, (b) 10 µm, (c) 20 µm, (d) 30 µm, (e) 40 µm, and (f) 50 µm at ambient temperature. The height scale in (a) is 120 nm and in (b)–(f) is 10 nm.

Figure 5

FIG. 5. SEM images of TiO2 structures prepared by inkjet printing with different DS values at ambient temperature. (a) and (b) show the DS 5 µm film at magnifications of 5 and 25k, respectively; (c) and (d) show the DS 30 µm film at magnifications of 25 and 50k, respectively.

Figure 6

FIG. 6. Microscope images of TiO2 structures prepared by inkjet printing with DS (a) 5 µm, (b) 10 µm, (c) 20 µm, (d) 30 µm, (e) 40 µm, and (f) 50 µm at 60 °C.

Figure 7

FIG. 7. AFM images of NP-TiO2 films prepared by inkjet printing with DS (a) 5 µm, (b) 10 µm, (c) 20 µm, (d) 30 µm, (e) 40 µm, and (f) 50 µm at 60 °C. The height scale is 10 nm.

Figure 8

TABLE II. Morphological parameters obtained from AFM image analysis of inkjet-printed NP-TiO2 films prepared at 60 °C.