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Transmittance in a thin aluminum layer at nanosecond pulsed laser ablation

Published online by Cambridge University Press:  13 February 2017

Y.V. Senatsky*
Affiliation:
P.N. Lebedev Physics Institute of the Russian Academy of Sciences, Leninsky prospect, 53, 119991 Moscow, Russia
N.E. Bykovsky
Affiliation:
P.N. Lebedev Physics Institute of the Russian Academy of Sciences, Leninsky prospect, 53, 119991 Moscow, Russia
S.M. Pershin
Affiliation:
A.M. Prokhorov General Physics Institute of the Russian Academy of Sciences, Vavilova Street, 38, 119991 Moscow, Russia
A.A. Samokhin
Affiliation:
A.M. Prokhorov General Physics Institute of the Russian Academy of Sciences, Vavilova Street, 38, 119991 Moscow, Russia
*
Address correspondence and reprint requests to: Y.V. Senatsky, P.N. Lebedev Physics Institute of the Russian Academy of Sciences, Leninsky prospect, 53, 119991 Moscow, Russia. E-mail: senatsky@sci.lebedev.ru

Abstract

Since the beginning of the 1960s and up to the present time, laser ablation from metal surfaces under the action of short light pulses has been the topic of many researches. One of the first objects in the early ablation experiments presented thin metal films evaporated by radiation, which were used in lasers with nanosecond pulses as optical gates for Q-switching in resonators or for decoupling in amplifiers. Bleaching of the gates based on metal layers with a time constant τt ≈ 10−8 s observed in a number of experiments, was usually considered as a result of a simple evaporation of matter. We analyze the data of the experiments with a mylar tape [≈0.05 µm aluminum (Al) layer on ≈20 µm lavsan substrate] used as a gate for optical isolation in one of the first Nd: glass laser facilities with a power of ≈1 GW. That gate was irradiated by pulses of Q-switched oscillators: pulse duration 10−7–10−8 s, intensity 107–108 W/cm2. A jump in the transmittance of the expanding Al layer was registered (from ≈0.1 to 50% at τt ≈ 10−9 s). The present study shows that one should consider the metal–insulator phase transition in a superheated liquid metal layer as the mechanism of the fast (up to 10–10–10–11 s) increase in the transmittance of the Al film gate at nanosecond-pulsed laser ablation.

Information

Type
Research Article
Copyright
Copyright © Cambridge University Press 2017 
Figure 0

Fig. 1.(a) Schematics of the oscillator with a rotating prism Q-switch and a two-cascade amplifier based on KGSS-7 Nd:glass rods Ø30 × 600 mm (1–3) with a mylar gate (5), 4 – output coupler; (b, c) oscillograms of laser pulses: at the output of the oscillator (b) and at the output of the oscillator–amplifier system with a mylar gate (c).

Figure 1

Fig. 2.(a) Schematics of the experiment on shaping laser pulses of a Q-switched oscillator (1) by an external mylar film gate (4): diaphragm (2), glass plate (3), filters (5), prisms (6), photocell (7), oscilloscope (8). Oscillograms before (left) and after the gate and the optical delay line (right): ablation of the Al film by beams of Ø10 mm (b); Ø5 mm (c); Ø1.5 mm (d).

Figure 2

Fig. 3.The dependence of the transmittance Kint of Al films of different thicknesses on the energy density incident on the Al layer at different values of the film initial transmission: 1–2.2; 2–1.0; 3–0.5; 4–0.05% (Vanyukov et al., 1971).