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Nitrogen-vacancy centers close to surfaces

Published online by Cambridge University Press:  06 February 2013

Jörg Wrachtrup
Affiliation:
Stuttgart University and Max Planck Institute for Solid State Physics; j.wrachtrup@physik.uni-stuttgart.de
Fedor Jelezko
Affiliation:
Ulm University; fedor.jelezko@uni-ulm.de
Bernhard Grotz
Affiliation:
Stuttgart University; b.grotz@physik.uni-stuttgart.de
Liam McGuinness
Affiliation:
Ulm University; liam.mcguinness@uni-ulm.de

Abstract

Defects in solid-state systems are responsible for much of what we take for granted in modern society, with applications ranging from electronics and lasers, to metallic alloys with tailored properties, and the unique characteristics of gemstones. As we enter the age of quantum technology, solid-state defects are also having their say, with substantial research focused on using their properties for fundamental tests of quantum mechanics, storage of quantum information, and investigations of quantum decoherence. Two of the most exciting prospects of quantum technology are the creation of computers that take advantage of quantum rather than classical laws to outperform current devices, and the realization of highly sensitive magnetometers limited only by quantum uncertainty. In pursuit of these two goals, many proposals and proof-of-principle experiments have been performed in the solid-state, which required location of defects very close to the host crystal’s surface. This article reviews recent work on creation of nitrogen-vacancy centers near the diamond surface and experiments toward the realization of these goals.

Information

Type
Research Article
Copyright
Copyright © Materials Research Society 2013 
Figure 0

Figure 1. (a) Confocal image of an implanted array of nitrogen-vacancy (NV) centers. Distance between centers is 10 μm. Adapted from Reference 13. (b) NV scanning nanomagnetometer consisting of an AFM tip with attached nanodiamond. The sensitivity limit enables imaging of single spins. (c) Coupling between a NV center and a plasmonic structure. Adapted from Reference 1.

Figure 1

Figure 2. (a) Scanning electron microscope image of an implantation mask (mica), manufactured by focused ion beam milling. Adapted from Reference 5. (b) Transmission electron microscope image of a nanodiamond. Adapted from Reference 59.

Figure 2

Figure 3. (a–c) Confocal scans of a 10 keV implanted diamond surface showing the fluorescence intensity of NV− (650 nm long pass filter, 532 nm excitation at 240 μW) at different implantation doses (1010 cm–2, 1011 cm–2, and 1012 cm–2, corresponding to low, medium, and high, respectively). (c) Dashed lines indicate O- (squares) and H-terminated (channel) regions. The negative electron affinity of the H-terminated regions leads to conversion of NV– to NV0 and thus to reduced fluorescence, but at high doses, this effect is shielded by the electron donating N atoms. Scale bar is 10 μm. (d) Relative contribution to the local fluorescence intensity of NV− and NV0, obtained from fits to spectra of single NV− or NV0 in H-terminated regions. Adapted from Reference 44.

Figure 3

Figure 4. (a) Fluorescence image of a 5 keV spot in a hydrogenated region at gate potential UG = 0.5 V. Scale bar indicates 1 μm. (b) Selected centers at various gate voltages. (c) Number of NV centers visible in the scanned region of (a) at different gate voltages. (d) Photon statistics (correlation function of second order) g(2)(t) measured on a single center (background corrected, UG = 0.5 V). (e–f) Gate voltage dependence of the fluorescence intensity of two single NV centers. Different switching voltages can be attributed to slightly varying depths and nano-environments. Adapted from Reference 49.