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Unidirectional self-patterning of CaF2 nanorod arrays using capillary pressure

Published online by Cambridge University Press:  19 January 2011

D. Han
Affiliation:
Nanoelectronics Laboratory, Department of Electrical and Computer Engineering, University of Cincinnati, Cincinnati, Ohio 45221-0030
H. Li
Affiliation:
Department of Physics, Applied Physics, and Astronomy, Rensselaer Polytechnic Institute, Troy, New York 12180-3590
T.M. Lu
Affiliation:
Department of Physics, Applied Physics, and Astronomy, Rensselaer Polytechnic Institute, Troy, New York 12180-3590
A.J. Steckl*
Affiliation:
Nanoelectronics Laboratory, Department of Electrical and Computer Engineering, University of Cincinnati, Cincinnati, Ohio 45221-0030
*
a)Address all correspondence to this author. e-mail: a.steckl@uc.edu

Abstract

Highly aligned microstrip patterns consisting of biaxial CaF2 nanorods have been successfully self-assembled by simply using capillary pressure. The alignment direction of the microstrips is perpendicular to the flux direction during nanorod growth. Aligning behavior and pattern width can be controlled by changing wetting time and surface tension of the liquid. Higher surface tension and longer wetting time result in wider pattern width and better alignment. Taller nanorod height also results in better pattern alignment. Simple and cost-effective self-aligned microstrip patterns can be potentially used as a template for various applications, such as superhydrophobic surfaces, tissue scaffolds, microchannels, and optical polarizers.

Information

Type
Reviews
Copyright
Copyright © Materials Research Society 2011
Figure 0

FIG. 1.SEM images of CaF2 biaxial nanorods: (a) side view; (b) top view.

Figure 1

FIG. 2.Effect of water droplet: water mark photos on CaF2 nanorod layers of (a) 1 μm and (b) 200 nm thickness; and WCA on (c) 1-μm-thick CaF2 nanorod layer and on (d) CaF2 film with no nanorods.

Figure 2

FIG. 3.SEM observation: (a) original surface of 1 μm tall CaF2 nanorods (1 k× magnification); self-aligned microstrip patterns formed by water at (b) 1 k× and (c) 5 k× magnification; (d) cross-section view of microstrip patterns at 10 k×.

Figure 3

FIG. 4.SEM observation of (a) self-aligned microstrip patterns formed by ethanol; (b) self-aligned microstrip patterns of 200 nm tall CaF2 nanorods formed by water.

Figure 4

FIG. 5.Optical microscope observation: (a) schematic diagram for self-aligned pattern formation. (b) A and B regions wet by water droplet and capillary-driven water, respectively, and the dried C region has self-aligned microstrip patterns (100× magnification); (c) maintaining initial status from water droplet displacement (400× magnification); (d) self-assembling microstrip patterns in drying area (400× magnification); (e) dry surface that has microstrip patterns (400× magnification).

Figure 5

FIG. 6.Capillary pressure effect: microstrip width versus wetting time of water/ethanol.

Figure 6

FIG. 7.PDMS cast on CaF2 film: (a) SEM of patterned CaF2 film and PDMS template. (b) Contact angles on different axis of negative PDMS duplicate: parallel view to alignment axis (left), perpendicular view to alignment axis (middle), and on smooth PDMS film (right).