Hostname: page-component-74656f9884-c52kr Total loading time: 0 Render date: 2026-11-07T08:37:21.417Z Has data issue: false hasContentIssue false

Room temperature stress relaxation in nanocrystalline Ni measured by micropillar compression and miniature tension

Published online by Cambridge University Press:  01 April 2016

Gaurav Mohanty*
Affiliation:
Empa, Swiss Federal Laboratories for Materials Science and Technology, Laboratory for Mechanics of Materials and Nanostructures, CH-3602 Thun, Switzerland
Juri Wehrs
Affiliation:
Empa, Swiss Federal Laboratories for Materials Science and Technology, Laboratory for Mechanics of Materials and Nanostructures, CH-3602 Thun, Switzerland
Brad L. Boyce
Affiliation:
Sandia National Laboratories, Materials Science and Engineering Center, Albuquerque, New Mexico 87185, USA
Aidan Taylor
Affiliation:
Empa, Swiss Federal Laboratories for Materials Science and Technology, Laboratory for Mechanics of Materials and Nanostructures, CH-3602 Thun, Switzerland
Madoka Hasegawa
Affiliation:
Empa, Swiss Federal Laboratories for Materials Science and Technology, Laboratory for Mechanics of Materials and Nanostructures, CH-3602 Thun, Switzerland
Laetitia Philippe
Affiliation:
Empa, Swiss Federal Laboratories for Materials Science and Technology, Laboratory for Mechanics of Materials and Nanostructures, CH-3602 Thun, Switzerland
Johann Michler
Affiliation:
Empa, Swiss Federal Laboratories for Materials Science and Technology, Laboratory for Mechanics of Materials and Nanostructures, CH-3602 Thun, Switzerland
*
a) Address all correspondence to this author. e-mail: Gaurav.Mohanty@empa.ch

Abstract

In this study, we report a micropillar stress relaxation technique employing a stable displacement-controlled, in-situ scanning electron microscope indenter, and unusually large micropillars to precisely measure stress relaxation in electroplated nanocrystalline Ni thin films. The observed stress relaxation is significant under constant displacement: even well below the 0.2% offset yield strength, the stresses relax by ∼4% within a minute; in the work hardening regime, stress relaxes by ∼9% in 1 min. A logarithmic fit of the relaxation curves is consistent with an Arrhenius thermal activation of plasticity and suggests an activation volume in the vicinity of ∼10 b 3. The apparent and effective activation volumes diverge at lower strains, particularly in the “elastic” regime. These measurements are compared to similar measurements performed on free-standing thin film tensile coupons. Both methods yield similar results, thereby validating the applicability of pillar compression to capture time-dependent plasticity. To our knowledge, these are the first micropillar stress relaxation experiments on metals ever reported.

Information

Type
Articles
Copyright
Copyright © Materials Research Society 2016 
Figure 0

FIG. 1. Grain structure of electroplated nanocrystalline Ni characterized by bright field scanning TEM.

Figure 1

FIG. 2. Miniaturized tensile stage with 500 N load cell, displacement sensor, and hard metal grippers. The inset shows a nanocrystalline nickel microtensile bar produced using LIGA process.

Figure 2

FIG. 3. A large FIB milled micropillar of nanocrystalline Ni machined in the undeformed gripping section of a microtensile bar after it was tested in tension for stress relaxation.

Figure 3

FIG. 4. Repeated stress relaxation test on miniaturized tensile bar of nanocrystalline Ni. A consecutive series of six relaxation sequences were performed. The inset shows the stress–strain curve for this sample.

Figure 4

FIG. 5. Examples of the fit to extract the apparent activation volume and time constant for two different relaxation segments. The apparent activation volumes for these two fits were 8.5 and 10.4 b3, respectively.

Figure 5

FIG. 6. Multiple repeated stress relaxation tests performed on a single micropillar of nanocrystalline Ni. Note that the stress-strain curves have been corrected for instrument compliance. This results in constant displacement relaxation segments to show up as increasing strain segments during the relaxation hold period. Examples of relaxation segments below the 0.2% offset yield and in the fully plastic flow regime are shown.

Figure 6

FIG. 7. SEM images of the micropillar (a) before compression and (b) at strain of 20%.

Figure 7

FIG. 8. Examples of raw data and fits for two relaxation segments (R11 and R51). The correlation coefficients for these fits were 0.99.

Figure 8

FIG. 9. Apparent and effective activation volumes from micropillar multiple repeated stress relaxation tests. The effective activation volume obtained from tension test is also shown.

Figure 9

FIG. 10. Slip steps and grain boundary ledges apparent after room temperature strain rate jump tests on nanocrystalline Ni to a strain of 25%. Reproduced from Ref. 27 with permission of Philosophical Magazine.