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Self focusing of a laser pulse in plasma with periodic density ripple

Published online by Cambridge University Press:  19 March 2009

Sukhdeep Kaur*
Affiliation:
Center for Energy Studies, Indian Institute of Technology Delhi, New Delhi, India
A.K. Sharma
Affiliation:
Center for Energy Studies, Indian Institute of Technology Delhi, New Delhi, India
*
Address correspondence and reprint requests to: S. Kaur, Center for Energy Studies, Indian Institute of Technology Delhi, New Delhi-110016, India. E-mail: sukhdeep.iitd@gmail.com

Abstract

Propagation of an intense laser pulse in plasma with a periodically modulated density is considered using envelope equations. The laser induces modifications of the plasma refractive index via relativistic and ponderomotive nonlinearities. In the region of high plasma density, the self focusing effect of nonlinearity suppresses the diffraction divergence, and the laser converges. As the beam enters into the low density region, the diffraction tends to diverge it offsetting the convergence due to the curvature it has acquired. For a given set of plasma parameters, there is a critical power of the laser above which it propagates in a periodically focused manner. Below this power the laser undergoes overall divergence. At substantially higher powers, the laser beam continues to converge until the saturation effect of nonlinearity suppresses the self focusing and diffraction predominates. The effect of density ripple is to cause overall increase in the self focusing length. The minimum spot size decreases with the wave number of the ripple.

Information

Type
Research Article
Copyright
Copyright © Cambridge University Press 2009
Figure 0

Fig. 1. Schematic of a plasma with sinusoidal density ripple (a) and rectangular density profile (b).

Figure 1

Fig. 2. (Color online) (a) The variation of beam width parameter f with ξ for rectangular and sinusoidal density profiles based on analytical and numerical models. The parameters are ωp2/ω2 = 0.038, ${{r_0 {\rm \omega} } \over c}=75$, d = 50 and a0 = 0.1. For the sinusoidal profile modulation index α2 = 0.9 is used, and n00 is 0.02 times the critical density. (b) The variation of beam width parameter f with ξ for rectangular and sinusoidal density profiles based on analytical and numerical models. The parameters are ωp2/ω2 = 0.038, ${{r_0 {\rm \omega} } \over c}=75$, d = 50 and a0 = 0.4. For the sinusoidal profile modulation index α2 = 0.9 is used, and n00 is 0.02 times the critical density.

Figure 2

Fig. 3. (Color online) Critical power at normalized laser amplitude a0 = 0.18 –0.19, α1 = 0.02, α2 = 0.9, d = 50.

Figure 3

Fig. 4. (Color online) Variation of f with ξ for normalized laser amplitude a0 = 0.249 – 0.2515, where the critical power can be obtained at a0 = 0.25, α1 = 0.01, α2 = 0.2 and d = 50.

Figure 4

Fig. 5. (Color online) Comparison of beam width parameter at normalized laser amplitude a0 = 0.249 – 0.5 at α1 = 0.01, α2 = 0.2, d = 50.

Figure 5

Fig. 6. (Color online) Variation of beam width parameter f with distance of propagation ξ, for parameters α1 = 0.02, α2 = 0.9, ${{r_0 {\rm \omega} } \over c}=75$, d = 50 and d = 80, a0 = 1.0.