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GaN for space application: almost ready for flight

Published online by Cambridge University Press:  19 April 2010

Jean-Luc Muraro*
Affiliation:
Thales Alenia Space, 26 Avenue Jean François Champollion, BP 1187, 31037 Toulouse Cedex, France.
Guillaume Nicolas
Affiliation:
Thales Alenia Space, 26 Avenue Jean François Champollion, BP 1187, 31037 Toulouse Cedex, France.
Do Minh Nhut
Affiliation:
Thales Alenia Space, 26 Avenue Jean François Champollion, BP 1187, 31037 Toulouse Cedex, France. Thales Alenia Space, Via Saccomuro, 24 00131 Roma, Italy.
Stéphane Forestier
Affiliation:
Thales Alenia Space, 26 Avenue Jean François Champollion, BP 1187, 31037 Toulouse Cedex, France.
Stéphane Rochette
Affiliation:
Thales Alenia Space, 26 Avenue Jean François Champollion, BP 1187, 31037 Toulouse Cedex, France.
Olivier Vendier
Affiliation:
Thales Alenia Space, 26 Avenue Jean François Champollion, BP 1187, 31037 Toulouse Cedex, France.
Dominique Langrez
Affiliation:
Thales Alenia Space, 26 Avenue Jean François Champollion, BP 1187, 31037 Toulouse Cedex, France.
Jean-Louis Cazaux
Affiliation:
Thales Alenia Space, 26 Avenue Jean François Champollion, BP 1187, 31037 Toulouse Cedex, France.
Marziale Feudale
Affiliation:
Thales Alenia Space, Via Saccomuro, 24 00131 Roma, Italy.
*
Corresponding author: J.-L. Muraro Email: Jean-LucMuraro@thalesaleniaspace.com
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Abstract

On the last years, gallium nitride (GaN) technology has made a remarked breakthrough in the world of microwave electronics. Power transistors are now available. How this GaN technology would impact space-borne units is now a priority concern. Although the power capability of GaN technology is the first obvious profit, GaN could also be used for other applications like low noise amplifiers, mixers, and probably more. The high sustainable temperature of GaN transistors is most striking advantage for in-flight use. This is connected to packaging design which is also experiencing a lot of activities and quick progresses. Of course, space application is dependent upon the full demonstration of reliability and this constitutes another field of investigation. Finally, after 8 years of GaN studies, experimental results are presented: they open wide the road a revolution inside space-borne electronics: the rise of GaN.

Information

Type
Original Article
Copyright
Copyright © Cambridge University Press and the European Microwave Association 2010
Figure 0

Fig. 1. Reported RF output power density performance for GaN and GaAs transistor (ESA IPC source2006) [1].

Figure 1

Fig. 2. Test fixture of HPA 10 W (left side) and 150 W(right side).

Figure 2

Fig. 3. Optimization of fundamental Zload for PAE at Vds = 50 V, f0 = 2.5 GHz.

Figure 3

Fig. 4. Optimization of second harmonic Zload.

Figure 4

Fig. 5. Picture of measurement bench.

Figure 5

Fig. 6. Measurement of the low level gain of the HPA 10 W.

Figure 6

Fig. 7. HPA 10 W performance at 2 dB gain compression.

Figure 7

Fig. 8. HPA 10 W linearity performance.

Figure 8

Table 1. Summary of HPA 10 W performances.

Figure 9

Fig. 9. Measurement of the low level gain of the HPA 150 W.

Figure 10

Fig. 10. HPA 150 W performances at 2 dB gain compression.

Figure 11

Table 2. Summary of HPA 150 W performances.

Figure 12

Fig. 11. Possible improvements along a receiver RF chain.

Figure 13

Fig. 12. Simplified RFFE.

Figure 14

Fig. 13. Image rejection mixer topology.

Figure 15

Fig. 14. Photographs of C-band (a), Ku-band (b) and Ka-band (c) MMIC mixers.

Figure 16

Fig. 15. Conversion losses versus RF frequency (Ku-band mixer).

Figure 17

Fig. 16. Conversion losses versus RF input power (Ku-band mixer).

Figure 18

Fig. 17. Conversion gain versus RF frequency (Ku-band RFFE breadboard).

Figure 19

Fig. 18. Conversion gain versus RF input power (Ku-band RFFE breadboard).

Figure 20

Fig. 19. Implementation of GaN technology into a T/R module.

Figure 21

Fig. 20. GaN switch and LNA developed with SELEX-SI.

Figure 22

Fig. 21. Junction temperature versus output power, example for S-band SiC based HPA module. Thermal conductivity is set, respectively, to 200 and 550 W/mK for CuW and diamond copper.

Figure 23

Fig. 22. Semi-insulating, monocrystaline SiC thermal conductivity as a function of temperature (Source: TAS-F, guarded plate method).

Figure 24

Fig. 23. Conceptual view of a HPA module for space application (TAS-F background).

Figure 25

Fig. 24. Effect of diamond-copper-based micropackage compared to standard CuW (dissipated power of 44 W) [14]. Micropackage based on CuW technology: (T_junction = 171°C, with T base plate = 70°C). Micropackage based on diamond-copper technology: (T_junction = 142°C, with T base plate = 70°C).

Figure 26

Fig. 25. Drain saturation current versus time on GaN components from IAF −300°C Tj, Vds = 50 V, Ids = 100 mA.

Figure 27

Fig. 26. Drain saturation current versus time on GaN components from UMS −300°C Tj, Vds = 30 V, Ids = 260 mA.

Figure 28

Fig. 27. Linear gain versus time on GaN 10 W HPA from Eudyna −270°C Tj, Vds = 70 V, Ids = 240 mA.

Figure 29

Table 3. IAF and UMS process description.

Figure 30

Fig. 28. 10 W HPA Eudyna step stress results – Vds = 50 V, Ids = 100 mA; linear gain drift.