Hostname: page-component-74656f9884-rdgjk Total loading time: 0 Render date: 2026-11-08T06:41:58.146Z Has data issue: false hasContentIssue false

Oxide interfaces with enhanced ion conductivity

Published online by Cambridge University Press:  17 December 2013

Carlos Leon
Affiliation:
Department of Applied Physics, Universidad Complutense, Madrid; carlos.leon@fis.ucm.es
Jacobo Santamaria
Affiliation:
Applied Physics Department, Universidad Complutense, Madrid; jacsan@fis.ucm.es
Bernard A. Boukamp
Affiliation:
University of Twente, The Netherlands; b.a.boukamp@utwente.nl

Abstract

The new field of nano-ionics is expected to yield large improvements in the performance of oxide-based energy generation and storage devices based on exploiting size effects in ion conducting materials. The search for novel materials with enhanced ionic conductivity for application in energy devices has uncovered an exciting new facet of oxide interfaces. With judicious choice of the constituent materials, oxide heterostructures can exhibit enhanced ion mobility compared to the bulk counterparts. Here we review recent experimental and theoretical progress on enhancement of oxide-ion conductivity arising in oxide ultrathin layers and at their interfaces, and describe the different scenarios, space-charge effects, epitaxial strain, and atomic reconstruction at the interface, proposed to account for the observed conductivity enhancement.

Information

Type
Functional Oxide Interfaces
Copyright
Copyright © Materials Research Society 2013 
Figure 0

Figure 1. (a) Z-contrast STEM image of an epitaxial 1-nm-thick YSZ layer (marked by the arrow) between 10 nm STO layers in a [YSZ1 nm /STO10 nm ]9 superlattice (with nine repeats). (b) Low magnification image of the same superlattice. (c) Synchrotron x-ray diffraction (λ = 0.855 Å) pattern obtained at the beam line BM 25 of the European Synchrotron Radiation Facility (ESRF) of a 1 nm YSZ/10 nm STO superlattice with 20 bilayer repetitions. (d) Reciprocal space map referring to the STO structure in the 0.5, 1.5, 1.5 position. (e) Sketch showing that the lattice parameters of YSZ and STO in the (001) plane allow a coherent growth of YSZ layers despite a 7% tensile strain. Figure adapted with permission from References 14 and 65.

Figure 1

Figure 2. (a) Arrhenius plot for the conductance, G, in Siemens (S), of a [YSZ1 nm/STO10 nm]4 superlattice (stars) and a STO10 nm/YSZ1 nm/STO10 nm trilayer (circles) with 100-oriented YSZ layers compared to that of a STO20 nm film (squares) and a bare STO substrate (triangles). The colored band represents the conductance range of [YSZ1 nm/STO10 nm] superlattices and trilayers of several different thicknesses and with 110-oriented YSZ layers. (b) Conductance at 400 K of [YSZ1 nm/STO10 nm]ni/2 superlattices (with ni/2 repeats) as a function of the number of interfaces ni. (c) AFM image of a 1 nm-thick YSZ layer grown on TiO2 terminated 0.1% wt. Nb doped STO. It shows well-defined steps one unit cell high separating vicinal terraces that indicate a two-dimensional growth mode. Figure adapted with permission from References 14 and 65.

Figure 2

Figure 3. Sketches showing (a) the plane sequence for the growth of (100) YSZ/STO superlattices, with nonpolar STO (100) planes alternating with strongly polar YSZ (100) planes; (b) the nucleation of oxygen vacancies at the interface to avoid polarity mismatch and to restore charge neutrality; and (c) the formation of an (ZrO)2+ plane with rock salt structure that also preserves charge neutrality in the symmetrically terminated YSZ layer and avoids polarity mismatch.