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Modulation of continuous ion beams with low drift velocity by induced wakefield in background plasmas

Published online by Cambridge University Press:  01 February 2013

Zhang-Hu Hu
Affiliation:
School of Physics and Optoelectronic Technology, Dalian University of Technology, Dalian, China
Yuan-Hong Song
Affiliation:
School of Physics and Optoelectronic Technology, Dalian University of Technology, Dalian, China
Yong-Tao Zhao
Affiliation:
Institute of Modern Physics, Chinese Academy of Science, Lanzhou, China
You-Nian Wang*
Affiliation:
School of Physics and Optoelectronic Technology, Dalian University of Technology, Dalian, China
*
Address correspondence and reprint requests to: You-Nian Wang, School of Physics and Optoelectronic Technology, Dalian University of Technology, Dalian, China116024. E-mail: ynwang@dlut.edu.cn

Abstract

Two-dimensional particle-in-cell simulations are performed to investigate the propagation of low energy continuous ion beams through background plasmas. It is shown that the continuous ion beam can be modulated into periodic short beam pulses by the induced wakefield, which can be adopted as a method to produce ultrashort ion beam pulses. Furthermore, the transport of the continuous ion beam in plasma with density gradient in the beam propagation direction is proposed and an enhanced longitudinal compression by density gradient is found due to the phase lock of ion pulses in the focusing regions of wakefield and reduced heating of plasma electrons.

Information

Type
Research Article
Copyright
Copyright © Cambridge University Press 2013
Figure 0

Fig. 1. The ion beam density propagating in uniform plasmas at time t = 4.2 ns in the cases of different plasma densities (a) ne0 = 2 × 1011 cm−3, (b) ne0 = 5 × 1011 cm−3, and (c) ne0 = 1012 cm−3. A continuous ion beam with initial drift velocity Vb0 = 8 × 106(m/s), radius rb = 2.2 mm, and unperturbed density nb0 = 1.5 × 1011 cm−3 is assumed.

Figure 1

Fig. 2. The corresponding wakefield with the same parameters as in Figure 1.

Figure 2

Fig. 3. The on-axis ion beam density and wakefield at time (a) t = 1.8 ns and (b) 3.52 ns with the same beam and plasma parameters as in Fig. 1(b), except the unperturbed beam density adopted here nb0 = 3 × 1011 cm−3.

Figure 3

Fig. 4. The comparisons of on-axis wakefield (a) and electron density (b) at time t = 3.52 ns between the cases of uniform plasma with unperturbed density ne0 = 1012 cm−3 and nonuniform plasma with density increasing linearly from ne0(0) = 2.7 × 1011 cm−3on the left to ne0(Lz) = 1012 cm−3 (a0 = 2.7) on the right. The corresponding on-axis ion beam density (c) at time t = 3.87 ns and radial distribution of two ion pulses with peak density in each case (the insert small figure) are also shown. A continuous ion beam with drift velocity Vb0 = 8 × 106(m/s), beam radius rb = 0.2 mm and peak beam density nb0 = 3 × 1011 cm−3 is assumed in both cases.

Figure 4

Fig. 5. The time evolution of maximum pulse density for density gradient a0 = 0 (uniform plasma), 1, and 2.7, with the same beam parameters in Figure 4. For all three cases, the simulation length Lz is the same and background plasma density at the right boundary is fixed to be 1012 cm−3.

Figure 5

Fig. 6. The on-axis ion beam density and wakefield at time (a) t = 1.8 ns and (b) 3.52 ns for the case of nonuniform plasma a0 = 2.7. The beam and plasma parameters are the same as those of nonuniform plasma case in Figure 4.