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Fracture resistance of Cu/Nb metallic nanolayered composite

Published online by Cambridge University Press:  15 May 2019

Sixie Huang
Affiliation:
Department of Materials Science and Engineering, Missouri University of Science and Technology, Rolla, Missouri 65409, USA
Caizhi Zhou*
Affiliation:
Department of Materials Science and Engineering, Missouri University of Science and Technology, Rolla, Missouri 65409, USA
*
a)Address all correspondence to this author. e-mail: zhouc@mst.edu

Abstract

In this work, molecular dynamics simulations to explore the crack propagation and fracture behavior of Cu/Nb metallic nanolayered composites (MNCs) were performed. The results of this study are consistent with the previous experimental results, which illustrated that cracks in Cu and Nb layers may exhibit different propagation paths and distances under the isostrain loading condition. The analysis reveals that the interface can increase the fracture resistance of the Nb layer in Cu/Nb MNCs by providing the dislocation sources to generate the plastic strain at the front of the crack. Increasing the layer thickness can enhance the fracture resistance of both Cu and Nb layers, as the critical stress for activating the dislocation motion decreases with the increment of the layer thickness. In addition, grain boundaries (GBs) in polycrystalline Cu/Nb samples would decrease the fracture resistance of Nb layer by promoting the crack propagate along the GBs, i.e., intergranular fracture, while the effect of interface and layer thickness on the fracture resistance of MNCs will not be altered by introducing the GBs in MNCs.

Figure 0

Figure 1: Atomistic structures of different samples at 15% strain. Atoms colored by the green strain tensor component, εxx. (a) SX Cu, (b) Cu layer in 5 nm SX Cu/Nb, (c) Cu layer in 20 nm SX Cu/Nb, (d) SX Nb, (e) Nb layer in 5 nm SX Cu/Nb, and (f) Nb layer in 20 nm SX Cu/Nb.

Figure 1

Figure 2: (a) Plot of crack propagation distance for different SX samples. (b) SIF curves for different SX samples. (c) Green strain per volume for different SX samples.

Figure 2

Figure 3: (a) One crack in Cu/Nb MNCs from the experimental work [18]. (b) One crack in SX Cu/Nb samples in this study (the fractured layer is Nb layer and atoms were colored by their Y coordinate. Note: the crack growth direction is perpendicular to the paper in both experimental and simulation tests). (c) Dislocation nucleating from the interface and crack tip (atoms with BCC type were set invisible. Atoms were colored by their Z coordinate. Dislocations with green colors is for 1/2 〈111〉 in {110} slip system). (d) CLS of dislocations. (Dislocations with purple colors represent the dislocation junction.)

Figure 3

Figure 4: Atomistic structures for different PX samples at 12% strain: (a) PX Cu, (b) Cu layer in 5 nm PX Cu/Nb, (c) Cu layer in 20 nm PX Cu/Nb, (d) PX Nb, (e) Nb layer in 5 nm PX Cu/Nb, (f) Nb layer in PX 20 nm Cu/Nb, and (g) one example of the dislocation nucleating from the interface at the front of the crack within the Nb layer in 20 nm PX Cu/Nb sample. Atoms belong BCC and FCC atom are set invisible, and atoms are colored by their Z coordinate. The purple line represents the dislocation line, which belongs to 1/2 〈111〉 in {110} slip system.

Figure 4

Figure 5: (a) Plot of crack propagation distance for different PX samples. (b) SIF for different PX samples. (c) Green strain per volume for different PX samples.

Figure 5

Figure 6: Initial configuration of Cu/Nb samples with a preexisting crack: (a) SX Cu/Nb sample and (b) PX Cu/Nb sample. (Atoms are colored by the CAN method. Atoms with green, blue, and white represent the FCC, BCC, and unknown atoms, respectively. The unknown atoms generally represent the atoms located at GBs and interface.) The crystallographic orientation for Cu layer is set as x-$\left[ {11\bar{2}} \right]$, y-$\left[ {1\bar{1}0} \right]$, and z-[111], while the crystallographic orientation for Nb layer is set as x-$\left[ {11\bar{2}} \right]$, y-[111], and z-$\left[ {1\bar{1}0} \right]$. G1 have the same crystallographic orientation in (a), and G2, G3, and G4 were rotated by 30°, 60°, and 90° along the Z-axis.