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Measurement of local strain

Published online by Cambridge University Press:  11 June 2019

Christoph Gammer
Affiliation:
Erich Schmid Institute of Materials Science, Austrian Academy of Sciences, Austria; christoph.gammer@oeaw.ac.at
Marie-Ingrid Richard
Affiliation:
Aix-Marseille University and IM2NP, France; mrichard@esrf.fr
Chris Eberl
Affiliation:
Fraunhofer Institute IWM, and University of Freiburg, Germany; chris.eberl@iwm.fraunhofer.de

Abstract

Functional and mechanical properties of modern devices are directly controlled by the stress and strain state acting on the materials within. For manufacturers, elastic strain engineering of complex materials systems throughout processing and utilization is crucial. This requires methodologies with ever-increasing spatial and temporal resolutions. On the other hand, the nanoscale elastic strain field around individual defects fundamentally controls the deformation of crystalline materials. To date, a variety of techniques are available for measuring elastic strain, including transmission electron microscopy, electron backscatter diffraction, and x-ray diffraction. Recent advances in instrumentation have dramatically improved speed and resolution, enabling direct elastic strain mapping during in situ deformation at the nanoscale. In addition, plastic strain can be determined during deformation using digital image correlation. Current techniques are surveyed here to accurately quantify complex strain fields at the nanoscale and their potential to resolve scientific challenges in materials science.

Information

Type
Advances in In situ Nanomechanical Testing
Copyright
Copyright © Materials Research Society 2019 
Figure 0

Table I. Summary of the most important techniques for elastic strain mapping.

Figure 1

Figure 1. Residual stress evaluation via four-slot focused ion beam milling of a CrN coating. (a) A Pt pad serves as a reference surface for digital image correlation (DIC). (b) In step I, a two-slot milling sequence is performed for uniaxial stress relief followed by (c) a second milling sequence in step II for full biaxial stress. (d) Using DIC, the relaxation strain as a function of milling step can be calculated and used to determine the average residual stress in the coating at the micron level. The x direction is normal to the extent of the first slots and the y-direction parallel to the first slots. Strain-X is strain in the x direction, Strain-Y is strain in the y direction.14

Figure 2

Figure 2. Bragg coherent diffraction imaging during in situ deformation. (a) An individual Au nanowire is mounted on a microelectromechanical systems-based tensile stage. (b) During the tensile tests, lattice strain from Bragg peak analysis was measured and compared to the plastic strain obtained using digital image correlation (DIC). The differences in elastic strain between tests 3 and 4 are caused by slightly different scan areas.25

Figure 3

Figure 3. Experimental procedure of the in situ nanobeam electron diffraction (NBED) technique. In a conventional deformation experiment in the transmission electron microscope (TEM), a sample is deformed, and a video is acquired using a chosen imaging condition. During NBED mapping, a video is acquired in using the annular dark-field (ADF) detector in scanning transmission electron microscopy (STEM) mode, while at the same time a full diffraction pattern (DP) is recorded for each beam position. The series of NBED patterns contains a vast amount of information and the intensity of the Bragg spots allows for the reconstruction of virtual dark-field videos, while their position allows to determine the local elastic strain.5