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Properties of epitaxial graphene grown on C-face SiC compared to Si-face

Published online by Cambridge University Press:  23 September 2013

Leif I. Johansson*
Affiliation:
Department of Physics, Chemistry and Biology, Linköping University, SE-58183 Linköping, Sweden
Chariya Virojanadara*
Affiliation:
Department of Physics, Chemistry and Biology, Linköping University, SE-58183 Linköping, Sweden
*
a) Address all correspondence to these authors. e-mail: lejoh@ifm.liu.se
b) e-mail: chavi@ifm.liu.se

Abstract

Epitaxial graphene of uniform thickness prepared on SiC is of great interest for various applications. On the Si-face, large area uniformity has been achieved, and there is a general consensus about the graphene properties. A similar uniformity has yet not been demonstrated on the C-face where the graphene has been claimed to be fundamentally different. A rotational disorder between adjacent graphene layers has been reported and suggested to explain why multilayer C-face graphene show the π-band characteristic of monolayer graphene. Utilizing low energy electron microscopy, x-ray photoelectron electron microscopy, low energy electron diffraction, and photoelectron spectroscopy, we investigated the properties of C-face graphene prepared by sublimation growth. We observe the formation of micrometer-sized crystallographic grains of multilayer graphene and no rotational disorder between adjacent layers within a grain. Adjacent grains are in general found to have different azimuthal orientations. Effects on C-face graphene by hydrogen treatment and Na exposure were also investigated and are reported. Why multilayer C-face graphene exhibits single layer electronic properties is still a puzzle, however.

Information

Type
Invited Papers
Copyright
Copyright © Materials Research Society 2013 
Figure 0

FIG. 1. (a) LEEM image collected from a furnace-grown 6H-SiC Si-face graphene sample at an FOV of 20 μm and an electron energy of 4.6eV. Micro-LEED patterns (400-nm probing area) recorded at 60 eV from (b) 1-ML and (c) 2-ML areas. High energy resolution PADs, Ei(kx,ky), collected from (d) 1-ML and (e) 2-ML graphene areas at an initial energy, Ei, of 2.5 eV. Two π bands are clearly seen from the 2-ML areas.

Figure 1

FIG. 2. (a) LEEM image recorded from a 6H-SiC C-face graphene sample at 0.4 eV and an FOV of 10 μm. (b) I(V) curves extracted from the different areas labeled A to P in (a), showing a coverage of mainly 2 MLs of graphene. (c) Micro-LEED patterns, collected at 45 eV using a probing area diameter of 400 nm, from two different grains/domains in (a). (d) C 1s spectrum recorded using three different photon energies showing contribution from graphene (G) and the SiC substrate. (e) The π-band recorded around the $\bar K$ point using a photon energy of 33 eV.

Figure 2

FIG. 3. (a) LEEM image recorded from a 4H-SiC C-face graphene sample at 1.3 eV and an FOV of 10 μm. (b) Electron reflectivity curves extracted from different areas labeled 1–8. (c) The two upper panels show selected area LEED patterns collected at 45 eV using a probing area of 400 nm from the positions labeled 1 and 2 in Fig. 3(a). The lower panel shows the LEED pattern collected using a 5-μm aperture at position 2. (d) Shows two constant initial energy PAD patterns, Ei(kx,ky), of the π-band collected using a probing area of 800 nm, a photon energy of 45 eV, and at an energy of about 2 eV below the Fermi level. One Dirac cone centered around each of the six $\bar K$ points in the Brillouin zone is clearly observed.

Figure 3

FIG. 4. LEEM images collected at an FOV of 25 μm from a 6H-SiC C-face graphene sample using an energy of (a) 3.9 eV and from another position (c) at an energy of 5.1 eV. The I(V) curves in (b) and (d), extracted from different locations in (a) and (c) respectively, reveal fairly large areas of 1, 4, and 5 MLs and 2 MLs of graphene.

Figure 4

FIG. 5. (a) C 1s spectra collected, using a probing area of 4 μm, from the marked areas in Fig. 4 with different numbers of graphene layers. (b)–(g) show 1.5-μm selected area LEED patterns from: the 1-ML area at (b) 45 eV and (c) 145 eV; the 2-ML area at (d) 45 eV and (e) 145 eV; and the 4-ML area at (f) 45 eV and (g) 130 eV, respectively. In (h)–(j), PADs, Ei(kx,ky), recorded from, respectively, the 1-ML, 2-ML, and 4-ML areas are shown. The PADs were collected at 1.5 eV below the Fermi level, using a probing area of 800 nm.

Figure 5

FIG. 6. LEEM images collected from a 6H-SiC C-face graphene sample at 1.7 eV and an FOV of 50 μm: (a) as-grown and (b) after hydrogen treatment. The images in (c) and (d) were collected at an FOV of 25 μm from another hydrogen-treated sample at energies of 1.7 and 6.5 eV, respectively. The circular dark and bright spot seen in (c) and (d) was created by electron beam illumination during collection of micro-LEED patterns.

Figure 6

FIG. 7. (a) to (d) micro-LEED patterns recorded, from the hydrogenated sample shown in Figs. 6(c) and 6(d), using an energy of 45 eV and a probing area of 1.5 μm. The pattern was found to change from the (1 × 1) in (a) to that in (b), containing superstructure spots within a minute. When moving to another spot on the sample and using a low electron beam current, the (1 × 1) pattern in (c) was observed. When increasing to the normally used high electron beam current, the pattern in (d) appeared within a minute. The same pattern collected at (e) 80 eV and (f) 142 eV.

Figure 7

FIG. 8. The π-band structure recorded close to the $\overline K$ point along the A–$\overline K$–A′ direction from the 6H-SiC C-face graphene sample shown in Fig. 2, using conventional ARPES, before and after Na deposition and after heating at different temperatures. A photon energy of 33 eV was used.

Figure 8

FIG. 9. PADs, Ei(kx,ky), extracted around the $\overline K$ point from recorded ARPES spectra collected from the 6H-SiC C-face graphene sample before (upper panel) and after (lower panel) Na deposition. The wavevector kx is along the $\overline \Gamma - \overline K - \overline M$ direction and ky along A–$\overline K$–A′.