Hostname: page-component-6898cfcb55-zsp5v Total loading time: 0 Render date: 2026-11-11T18:18:14.870Z Has data issue: false hasContentIssue false

Atomic layer deposition: A versatile technique for plasmonics and nanobiotechnology

Published online by Cambridge University Press:  19 January 2012

Hyungsoon Im
Affiliation:
Laboratory of Nanostructures and Biosensing, Department of Electrical and Computer Engineering, University of Minnesota, Minneapolis, Minnesota 55455
Nathan J. Wittenberg
Affiliation:
Laboratory of Nanostructures and Biosensing, Department of Electrical and Computer Engineering, University of Minnesota, Minneapolis, Minnesota 55455
Nathan C. Lindquist
Affiliation:
Laboratory of Nanostructures and Biosensing, Department of Electrical and Computer Engineering, University of Minnesota, Minneapolis, Minnesota 55455
Sang-Hyun Oh*
Affiliation:
Laboratory of Nanostructures and Biosensing, Department of Electrical and Computer Engineering, University of Minnesota, Minneapolis, Minnesota 55455
*
a)Address all correspondence to this author. e-mail: sang@umn.edu

Abstract

Although atomic layer deposition (ALD) has been used for many years as an industrial manufacturing method for microprocessors and displays, this versatile technique is finding increased use in the emerging fields of plasmonics and nanobiotechnology. In particular, ALD coatings can modify metallic surfaces to tune their optical and plasmonic properties, to protect them against unwanted oxidation and contamination, or to create biocompatible surfaces. Furthermore, ALD is unique among thin film deposition techniques in its ability to meet the processing demands for engineering nanoplasmonic devices, offering conformal deposition of dense and ultrathin films on high-aspect-ratio nanostructures at temperatures below 100 °C. In this review, we present key features of ALD and describe how it could benefit future applications in plasmonics, nanosciences, and biotechnology.

Information

Type
Invited Feature Paper
Copyright
Copyright © Materials Research Society 2012
Figure 0

FIG. 1.Schematics of propagating surface plasmons, known as surface plasmon polaritons (SPPs) and localized surface plasmons (LSPs). Although SPPs propagate along the metal surface and decay exponentially in the perpendicular direction with a decay length of 100–300 nm in the visible frequencies, LSPs are more tightly bound on metallic nanostructures with a shorter decay length (10–50 nm).

Figure 1

FIG. 2.(a) Sequence of transmission spectra through a nanohole-based surface plasmon resonance (SPR) sensor as the thickness of atomic layer deposition (ALD)-grown Al2O3 overlayer increases from 0 to 42 nm in steps of 6 nm. (b) The spectral response of Au and Ag nanohole-based SPR sensors as the thickness of Al2O3 overlayer deposited on the surface increases. Both nanohole SPR sensors show a linear response to the thickness increases of Al2O3 layer up to 48 nm. Adapted from Im et al.31

Figure 2

FIG. 3.(a) Three-dimensional finite-difference time-domain (FDTD) computer simulations showing the time-averaged SP field intensity for different bulk refractive indices changing from 1.35 to 1.55. The maximum transmission occurs when the bulk refractive index matches with that of the glass substrate, 1.45. (b) An ALD overlayer can be also used to match the effective refractive index of the top surface with that of the glass substrate to boost the optical transmission through a metallic nanohole array. Adapted from Im et al.31

Figure 3

FIG. 4.Transmission spectra change as nanohole arrays made in Ag films are exposed to ultraviolet (UV) ozone for 1, 4, 7, and 10 min (a) without a protective Al2O3 overlayer and (b) with a 20-nm-thick Al2O3 overlayer. The transmission through the Ag nanohole array without the Al2O3 layer rapidly degrades during the UV–ozone process while the Al2O3-coated Ag nanohole array maintains its transmission spectrum for 10 min UV–ozone process. Adapted from Im et al.31

Figure 4

FIG. 5.(a) Fabrication process schematic of the nanogap array using ALD. Starting from metallic patterns, the secondary metal layer is separated from prepatterned metallic structures by a thin Al2O3 spacer. The nanogap size is determined by the thickness of the alumina layer. (b) Scanning electron microscope (SEM) images of various shapes of nanogap structures. Adapted from Im et al.57

Figure 5

FIG. 6.Confocal Raman imaging of nanogap structures formed along a surface-enhanced Raman spectroscopy (SERS) character pattern, showing the modulation of SERS hotspots along the polarization directions of an incident laser beam.

Figure 6

FIG. 7.(a) Cross-sectional SEM image of nanopores uniformly coated with a 20-nm-thick SiO2 layer to promote lipid bilayer formation. (b) A schematic of a free-standing metallic nanopore array for sensing in a pore-spanning lipid bilayer environment. Adapted from Im et al.59